Chinese Optics Letters, 2013, 11 (5): 053002, Published Online: Apr. 16, 2013  

Repetition rate dependence of absorption of fused silica irradiated at 193 nm

Author Affiliations
Abstract
Repetition rate-dependent absorbance measurements of synthetic fused silica at 193-nm irradiation are performed in the range of 50–1 000 Hz with an ArF laser calorimeter. The "apparent" single- and twophoton absorption coefficients are determined by measuring the laser fluence-dependent absorbance of fused silica samples with different thicknesses to separate the surface absorption and bulk absorption. The measurement results indicate a reversible nonlinear increase of both apparent single- and two-photon absorption coefficients with increasing repetition rate for the synthetic fused silica, whereas the surface absorption shows no dependence on the repetition rate.

Weijing Liu, Bincheng Li. Repetition rate dependence of absorption of fused silica irradiated at 193 nm[J]. Chinese Optics Letters, 2013, 11(5): 053002.

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