从人眼安全的角度,设计并制备了对1 064 nm激光抑制并可用于1 550 nm激光测距以及3 μm～5 μm波段红外成像的滤光膜。选用ZnS、YbF3作为膜料组合、多光谱ZnS作为基底,利用薄膜设计软件对薄膜进行了优化设计。膜系设计通过合理的厚度控制和膜层安排,来增强薄膜的机械强度。滤光膜的制备采用了电子束沉积技术,通过离子辅助沉积和真空退火处理技术,进一步提高滤光膜的牢固性。光谱测试表明：在1 064 nm处的透射率仅为0.5%,1 550 nm处的透过率为99.3%,3 μm～5 μm波段的平均透过率大于96%,经分析YbF3的折射率在薄膜沉积过程中有所提高,但是对光谱曲线影响不大；可靠性测试表明：滤光膜能够耐受恶劣的环境考验,满足使用要求。

From the viewpoint of eye-safe, a filter film with 1 550 nm for laser ranging and 3 μm～5 μm spectral band for infrared imaging was designed and fabricated to inhibit 1 064 nm laser. In order to improve the mechanical strength of filter film, the thickness of every film layer was limited and the layers were reasonably arranged. ZnS and YbF3 were used as the materials and multi-spectral ZnS was used as the substrate. The filter film was fabricated by the electron beam deposition technique. Ion assisted deposition and vacuum annealing techniques were used to improve the stability of filter film. The result of spectrum measurement shows that the transmittance is only 0.5% for 1 064 nm laser and 99.3% for 1 550 nm laser, and the average transmittance is more than 99.6% for the range of 3.5 μm～3.9 μm. Although the refractive index of YbF3 increases in the process of deposition, the spectrum curve is not severely impacted. Environmental reliability tests were finished and results prove that the filter film is tolerant of harsh environment and can meet the requirement.