在康宁 7059玻璃衬底上采用磁控溅射、化学水浴和近空间升华法制备 CdS薄膜, 在 FTO、ITO、 AZO衬底上采用磁控溅射法制备 CdS薄膜。分别对两组 CdS薄膜的形貌、结构和光学性能进行了研究, 结果表明: 采用不同工艺和衬底条件制备的 CdS薄膜具有不同的形貌和结构, 并表现出不同的光学性能。对于不同的制备技术, 化学水浴法制备的 CdS薄膜在 520～820 nm范围的光谱平均透过率最高, 光学带隙最大为 2.418 eV, 磁控溅射法制备的 CdS薄膜在 820～1200 nm和 520～1200 nm范围的光谱平均透过率最高。对于不同的衬底条件, 在 FTO衬底上磁控溅射制备的 CdS薄膜在 820～1200 nm和 520～1200 nm范围的光谱平均透过率最高。

CdS films are deposited on Corning 7059 glass substrate by magnetron sputtering, chemical bath deposition and close space sublimation, and CdS films are deposited by magnetron sputtering on FTO, ITO and AZO substrates. The morphology, structure and optical properties of CdS films are investigated in two groups. The results show that morphology and structure of CdS thin films are different on different preparation processes and substrates conditions, and affect the optical properties of the corresponding CdS film. For the different deposition techniques, spectrum of CdS thin films prepared by chemical bath deposition has the highest average transmittance in the 520～820 nm range, the maximum optical band gap of 2.418 eV. Spectrum of CdS thin films prepared by magnetron sputtering has the highest average transmittance in 820～1200 nm and 520～1200 nm range. For different substrate conditions, Spectrum of CdS films prepared by magnetron sputtering has the highest average transmittance in 820～1200 nm and 520～1200 nm range on FTO substrate.