Chinese Optics Letters, 2013, 11 (s1): S10701, Published Online: May. 30, 2013  

Residual stress prediction and control of Ta2O5/SiO2 multilayer based on layer structure designing Download: 686次

Author Affiliations
Abstract
Residual stress, which can be inevitably introduced during the optical films deposition process, must be controlled in many applications since the surface deformation is caused. The residual stress is traditionally controlled by adjusting the process parameters. However, the process parameters are determined by other more desired properties in many fields. In these cases, layer structure is the only variable to change the residual stress status of the components. Ta2O5/SiO2 is most commonly used material pair in visible/near infrared (VIS/NIR) region. In this letter, stress behaviors of Ta2O5 and SiO2 single layers deposited by ion-assisted deposition (IAD) are studied. Stress-thickness linear correlation curves of the two materials are obtained, which agree with the commonly reported linear results. Based on these features, a kind of antireflection (AR) coating acted as back side coating is designed to control the residual stress of components by the layer structure designing. A series of AR coatings at 1 319 nm are designed, according to residual stress status desired to introduce.

Songwen Deng, Feng Wang, Shunfu Liu, Gang Li, Long Sun, Yuqi Jin. Residual stress prediction and control of Ta2O5/SiO2 multilayer based on layer structure designing[J]. Chinese Optics Letters, 2013, 11(s1): S10701.

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!