为实现空间碳化硅反射镜表面硅改性层的精密抛光，提出了由计算机数控抛光、柔性化学机械抛光和离子束抛光这三种抛光技术相结合的组合式加工方法。分别介绍了三种抛光技术的抛光原理、抛光设备、抛光实验以及各自在组合加工中所起到的作用。计算机数控抛光可在一定程度上提高反射镜表面硅改性层的面形精度并降低其表面粗糙度。柔性化学机械抛光可以进一步改善反射镜表面硅改性层的表面粗糙度和光洁度。离子束抛光用以最终提高反射镜的面形精度。采用组合式加工方法对表面改性空间相机碳化硅平面反射镜进行了抛光。抛光后，空间碳化硅反射镜的面形精度均方根值达到0.014λ(λ=0.6328 μm)，表面粗糙度的均方根值达到0.71 nm。

To actualize precise polishing of silicon modification layer on space silicon carbide mirror, combined type polishing technology, consisting of computer-controlled optical surfacing (CCOS), flexible chemical mechanical polishing (FCMP) and ion beam figuring (IBF), is presented. The polishing principles, polishing machines, polishing experiments and polishing functions of three type polishing technologies are introduced, respectively. To improve figure accuracy and reduce surface roughness of silicon modification layer in a way, computer-controlled optical surfacing technology is adopted. The surface roughness and surface finish of silicon modification layer are improved further by flexible chemical mechanical polishing technology. The high figure accuracy of silicon modification layer is achieved finally by ion beam figuring technology. The surface modification silicon carbide plane mirror for space camera is polished by the combined type polishing technology. After polished, root mean square values of the figure and roughness of the space silicon carbide mirror are 0.014λ (λ=0.6328 μm) and 0.71 nm, respectively.