Chinese Optics Letters, 2013, 11 (7): 073101, Published Online: Jul. 4, 2013
Stress mechanism of pulsed laser-driven damage in thin film under nanosecond ultraviolet laser irradiation Download: 737次
310.0310 Thin films 140.0140 Lasers and laser optics 310.1620 Interference coatings 140.3440 Laser-induced breakdown 140.3380 Laser materials
Abstract
An analytical model is derived to describe the stress mechanism in a thin film against the laser-induced damage threshold (LIDT) based on the thermal transfer equation. Different structures of high-reflection films at 355 nm are prepared to validate this model. LIDTs are found to have a linear relationship with stress. Furthermore, predictions from the simple model agree with the experiments.
Zhenkun Yu, Hongbo He, Xu Li, Hongji Qi, Wenwen Liu. Stress mechanism of pulsed laser-driven damage in thin film under nanosecond ultraviolet laser irradiation[J]. Chinese Optics Letters, 2013, 11(7): 073101.