强激光与粒子束, 2013, 25 (9): 2275, 网络出版: 2013-08-28   

基频HfO2/SiO2高反射薄膜激光损伤生长特性

Laser damage growth characteristics of HfO2/SiO2 high reflection film at 1064 nm
张艳云 1,2,*马彬 1,2马宏平 1,2焦宏飞 1,2程鑫彬 1,2
作者单位
1 同济大学 精密光学工程技术研究所, 上海 200092
2 先进微结构材料教育部重点实验室, 上海 200092
摘要
以1064 nm波长作用下的HfO2/SiO2高反射薄膜为研究对象,研究了高反射薄膜在损伤生长过程中分层剥落初始损伤结构的变化规律、损伤形貌特征和损伤生长阈值等特性。实验结果表明:分层剥落初始损伤结构的横向尺寸随激光能量密度的增加呈分段线性增长,破斑沿纵向拓展的损伤生长阈值是沿横向拓展的损伤生长阈值的2倍以上,初始损伤结构横向尺寸的生长率与能量密度呈指数关系,且生长阈值随着辐照次数的增加显著降低。
Abstract
The high reflection films will be damaged when irradiated by high power laser. With the increasing of the laser energy and the numbers of irradiation, the sizes of the initial damaged structure will grow, which has a serious effect on the application of the optics. In this paper, the varying rules, the damage feature and the damage growth threshold of the HfO2/SiO2 high reflection films under 1064 nm laser irradiation have been investigated. The results indicate that the lateral dimension of the delamination initial damage structure increases almost multilinearly with the rise of laser fluence. The damaged growth threshold along the vertical expanding is more than twice as it along the horizontal expanding. In addition, the growth rate of the initial damaged structure grows with the rise of the laser fluence exponentially in the horizontal direction while the damage growth threshold decreases obviously with the rise of the shots.

张艳云, 马彬, 马宏平, 焦宏飞, 程鑫彬. 基频HfO2/SiO2高反射薄膜激光损伤生长特性[J]. 强激光与粒子束, 2013, 25(9): 2275. Zhang Yanyun, Ma Bin, Ma Hongping, Jiao Hongfei, Cheng Xinbin. Laser damage growth characteristics of HfO2/SiO2 high reflection film at 1064 nm[J]. High Power Laser and Particle Beams, 2013, 25(9): 2275.

本文已被 1 篇论文引用
被引统计数据来源于中国光学期刊网
引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!