Chinese Optics Letters, 2013, 11 (9): 090802, Published Online: Sep. 3, 2013
Glass homogeneity effect on wavefront aberration in lithography projection lens Download: 726次
080.3095 Inhomogeneous elements in optical systems 220.3740 Lithography 220.1000 Aberration compensation
Abstract
Analysis of glass homogeneity using the attaching interferometric data model neglects body distribution. To improve analysis accuracy, we establish the three-dimensional gradient index (GRIN) model of glass index by analyzing fused silica homogeneity distribution in two perpendicular measurement directions. Using the GRIN model, a lithography projection lens with a numerical aperture of 0.75 is analyzed. Root mean square wavefront aberration deteriorates from 0.9 to 9.65 nm and then improves to 5.9 nm after clocking.
Hongbo Shang, Wei Huang, Chunlai Liu, Weicai Xu, Wang Yang. Glass homogeneity effect on wavefront aberration in lithography projection lens[J]. Chinese Optics Letters, 2013, 11(9): 090802.