TFT-LCD产品为现代显示的主流, 如何提高其显示品质成为大家普遍关注的问题, 尤其近期发现的过孔发黑(黑点)问题尤为突出, 严重影响了产品的良率, 降低了产品的品质, 文章通过研究发现产生黑点不良的罪魁祸首不是过孔刻蚀的问题, 而是有源层刻蚀工艺所导致的, 并有针对性地进行了试验设计, 分别考察了有源层刻蚀条件、附加一步刻蚀方式对黑点不良的解决效果, 根据实验效果附加一步刻蚀方式完美地解决了黑点不良问题, 从而将产品的良率提升了3%~4%, 而电学性能评价(Ion: 开态电流、Ioff: 关态电流、Vth: 阈值电压、迁移率)和正常条件相比没有异常, 从而获得了最终完美的解决该不良的方案, 提高了产品品质。

In the trend of TFT-LCD display products, how to improve the quality of display is the main issue we commonly concern about, especially for the defect of black hole which was recently discovered and serious impact on product yield and reduce the quality. The main reasons of black hole were studied. To our surprised, active layer etching process was the main factor not the hole etch process, following with targeted trial design, the active etch condition and additional one step etch process were researched to solve problem. According to the experimental results of the additional one step etch, a solution to enhance product yield of about 3%~4% was found. The electronic parameter measurement was evaluated(Ion、Ioff、Vth、Mobility) and compared to the normal conditions without exception. Finally, a perfect solution was obtained. Therefore, the products quality was improved.