全反射X射线光学器件在X射线显微技术中具有重要的应用，有关其焦斑极限的研究对该器件的设计者和使用者具有指导意义。利用海森堡不确定性原理研究了全反射X射线光学器件的焦斑极限。理论结果表明：全反射X射线光学器件的焦斑极限与器件的材料有关；利用镍金属、铅玻璃和硼硅酸盐玻璃制成的全反射X射线光学器件的焦斑极限分别为3.2、4.2和6.6 nm。

Total-reflection X-ray optics play an important role in X-ray microscopy technology, and the study on their resolution limit is helpful for both designers and users. Theoretical study on the resolution limit of total-reflection X-ray optics is presented based on the Heisenberg uncertainty principle. The theoretical results show that the resolution limit of total-reflection X-ray optics depends on material. The focal spot size limits of total-reflection X-ray optics made of nickel, lead glass and borosilicate glass are 3.2, 4.2 and 6.6 nm, respectively.