强激光与粒子束, 2013, 25 (12): 3348, 网络出版: 2013-12-16
旋涂法制备KDP晶体减反膜
KDP crystal antireflective coatings prepared by spin coating method
KDP晶体 旋转涂膜 膜层均匀性 溶胶-凝胶 减反膜 KDP crystal spin coating coating uniformity sol-gel antireflective coating
摘要
对KDP晶体旋转涂膜过程中的技术问题进行了探讨,包括元件夹持安全性、膜层均匀性、膜层透射比、膜层疏水性能、膜层激光损伤阈值等。分析了晶体元件加速旋转阶段的受力情况,明确了KDP晶体元件在旋涂操作过程中受力状态的安全性。对不同溶剂体系的膜层均匀性进行了判断,在400 mm尺寸的元件上获得了透射比均匀性为0.3%的减反膜。对溶胶进行稳态剪切流变分析得知,在现有的涂膜转速 (对应剪切速率100~200 s-1)范围内,其粘度随着剪切速率的增加几乎不变,近似牛顿流体。在旋涂过程中,处于基底不同位置的溶胶的粘度大致相等,这是影响膜层均匀性的重要原因之一。膜层疏水性能较好,水接触角测试结果大于152°。在SiO2基底上制备的减反膜,1053 nm处透射比大于99.8%。在熔石英基片上制备的三倍频减反膜样品的激光损伤阈值约为10 J/cm2(355 nm, 3 ns)。
Abstract
The KDP crystal antireflective coatings prepared by spin coating method were discussed. The coating was modified using hexamethyl disilazane (HMDS), and had good moisture-resistant property. Some technique problems such as clamping safety during the spin process were analysed. The coating uniformity, the transmittance, moisture-resistant property and the laser induced damage threshold (LIDT) were measured. The transmittance ununiformity of the coating was about 0.3%, the transmittance at 1053 nm was over 99.8%, the water contact angle was over 152°, and the LIDT was about 10 J/cm2 (355 nm, 3 ns).
杨伟, 惠浩浩, 马红菊, 李文林, 雷向阳, 张清华. 旋涂法制备KDP晶体减反膜[J]. 强激光与粒子束, 2013, 25(12): 3348. Yang Wei, Hui Haohao, Ma Hongju, Li Wenlin, Lei Xiangyang, Zhang Qinghua. KDP crystal antireflective coatings prepared by spin coating method[J]. High Power Laser and Particle Beams, 2013, 25(12): 3348.