光子学报, 2014, 43 (1): 0131002, 网络出版: 2021-08-31
近红外宽截止窄带滤光膜的研制
Design and Fabrication of Near-infrared Narrow-band Filters with Wide Rejection Band
光学薄膜 窄带滤光膜 真空镀膜 离子辅助沉积 光学特性 膜系设计 膜厚监控 Optical films Narrow-band filter film Vacuum coating Ion-beam assisted deposition Optical character Film system design Thickness monitor
摘要
在空间光通信系统中,为满足光学系统对滤光膜的特殊要求,研制出了一种近红外宽截止窄带滤光膜,实现了降低深背景范围内杂散光干扰的要求.通过对薄膜材料特性的研究、膜系设计曲线的不断优化,得到了相对易于制备的窄带滤光膜结构;采用电子束加热蒸发及离子辅助沉积技术制备薄膜,采用光控加晶控同时监控的方法监控膜层厚度,通过不断优化工艺参量,提高中心波长处的透过率,最终成功得到了光谱性能较好的滤光膜.经光谱测试表明:所镀膜层在800~1 530 nm、1 600~1 800 nm波段平均透过率低于0.3%,1 565 nm单点透过率高于92%,通带半带宽为18 nm,满足光学系统的使用要求.
Abstract
In order to meet the special requirements for filter coating of the space optical communication system, a narrow-band filter with high rejection in near-infrared band was prepared. The filter can reduce the interference of the stray light perfectly in the range of deep background. Through analyzing the characteristics of the coating materials, continually optimizing the film system design curve, an easily prepared narrow-band filter film structure was obtained. Thin films were prepared through electron beam evaporation method and ion-assisted deposition technique, and the thickness of the filter was controlled using crystal-controlled and light control monitoring methods at the same time. By continually optimizing technical parameters, the transmittance of the central wavelength increased, and the filter membrane with better spectral performance was obtained successfully. After the spectrum testing, the average transmittance of the filter is lower than 0.3% at the band of 800~1 530 nm and 1 600~1 800 nm, the transmittance at 1 565 nm is higher than 92% and the full-width at half maximum of the filter is 18 nm, and the technical requirements of the optical system are satisfied.
刘冬梅, 王晓娟, 付秀华, 张静, 潘永刚. 近红外宽截止窄带滤光膜的研制[J]. 光子学报, 2014, 43(1): 0131002. LIU Dong-mei, WANG Xiao-juan, FU Xiu-hua, ZHANG Jing, PAN Yong-gang. Design and Fabrication of Near-infrared Narrow-band Filters with Wide Rejection Band[J]. ACTA PHOTONICA SINICA, 2014, 43(1): 0131002.