光学薄膜的光学特性是薄膜设计与制备的基础。硅材料是红外光学薄膜中一种重要的高折射率材料。研究了在不同沉积温度下非晶硅光学薄膜的折射率和消光系数的变化。结果表明，在200 ℃时，硅薄膜折射率最大，消光系数随温度升高而减小。

The optical character of optical thin films is the basis for the design and preparation of thin films. Silicon material is an important material of high refractive index at the infrared optical thin film. The changes of refractive index and extinction coefficient of amorphous silicon optical film in different deposition temperatures are studied. The results show that the silicon film has the maximum refractive index at 200 ℃, and the extinction coefficient decreases with temperature increases.