分析研究复合碳膜的制备及场发射效果。在陶瓷衬底上磁控溅射一层金属钛, 对金属钛层进行仔细研磨, 放入微波等离子体化学气相沉积腔中, 在镀钛陶瓷衬底上制备出碳膜。利用扫描电镜、x射线衍射、拉曼光谱分析复合碳膜的微观结构和微观表面形态, 表明此碳膜是含有碳纳米管、非晶碳和球状微米金刚石颗粒的复合碳膜。用二极管型结构测试了复合碳膜的场致发射电子的性能。首次发光的电场为0.75 V/μm, 稳定发光2.56V/μm的电场下, 复合碳膜阴极发射电流密度为7.25 mA/cm2。并对其复合碳膜制备成因及发射机理进行了研究。

With focus on preparation and Field Emission Effect.,carbon complex films were fabricated by microwave plasma chemical vapor deposition (MPCVD) method. The ceramic with a Ti buffer layer was used as substrate. The carbon complex films, which were combined by carbon nanotube, amphor carbon, the globe-like diamond microcrystalline-aggregates, were evaluated by Raman scattering spectroscopy, x-ray diffraction spectrum (XRD) and scanning electron microscope (SEM). The field emission properties were tested by using a diode structure in a vacuum. A phosphor-coated indium tin oxide (ITO) anode was used for observing and characterizing the field emission. It was found that carbon complex films exhibited good electron emission properties. The turn-on field was only 0.75V/μm and the emission current density as high as 7.25mA/cm2 was obtained under an applied field of 2.56V/μm for the last operation. The growth mechanism and field emission properties of the carbon complex films are discussed relating to microstructure and electrical conductivity.