采用射频磁控溅射方法, 分别在0.5 Pa, 1.0 Pa, 1.5 Pa以及2.0 Pa的溅射压强下制备出了Sc:ZnO(SZO)薄膜, 并用X射线衍射仪、扫描电子显微镜、紫外可见光分光光度计等设备对样品的晶体结构、表面形貌及光学性质进行了表征。结果表明, 当溅射压强为1.5 Pa时, SZO薄膜沿平行于衬底的(100)方向择优生长, 形成了织构化的表面形貌, 陷光效果增强, 可见光透过率达到87%, 同时其光散射能力也有了显著提高。

Scandium-doped ZnO (SZO) thin films have been prepared by radio frequency magnetron sputtering with the sputtering pressure varied from 0.5pa to 2.0pa.And the crystal structure, surface morphology, optical properties of these films are investigated by X-ray diffraction, SEM, UV-VIS spectrophotometer and so on. It is found that the preferred orientation of the films turn to (100) at 1.5 pa, which is parallel to the substrate, and the textured structure appears. It is conductive to light trapping so that the films obtain the highest transmittance of 87% in the visible range, and the light scattering capacity is also improved.