随着电子行业的迅速发展，对作为电子元器件基本构件的印制板的需求量及其加工精度的要求越来越高。紫外线曝光机是印制板制造工艺中的重要设备，光学曝光过程中对光照均匀性的要求很高。基于照明设计软件LightTools，设计了一种新的曝光机照明系统。通过大量的仿真模拟对系统进行优化。实验表明，优化后的照明系统设计使得光照度的均匀性在原来的基础上提高了8倍，在有效的视场范围内，光强分布均匀稳定，达到了PCB曝光机照明系统的要求。

Ultraviolet(UV) exposure machine is a very important equipment during manufacturing process of PCB, which has a high requires for the uniformity of the illumination in the optical exposure process. A new type of even illumination system in the exposure machine based on the powerful software LightTools is designed in this paper. To optimize the system, a large number of simulations are made. The Experiments results show that the optimized design of the lighting system allows the uniformity of illumination on the basis of the original 8-fold increase in the effective field of view, the light intensity distributes uniformity and stability.