采用化学水浴法和磁控溅射法分别在AZO、FTO、ITO透明导电玻璃衬底上制备了CdS薄膜，利用扫描电镜、XRD以及透射光谱等测试手段，研究了两种制备方法对不同衬底生长CdS薄膜形貌、结构和光学性能的影响.研究结果表明，不同方法制备的CdS薄膜表面形貌均依赖于衬底的类型，水浴法制备的CdS薄膜晶粒度较大，表面相对粗糙.不同方法制备的CdS薄膜均为立方相和六角相的混相结构，溅射法制备的多晶薄膜衍射峰清晰、尖锐，结晶性较好.水浴法制备的CdS薄膜透过率整体低于溅射法，但在短波处优势明显.

The CdS thin films were prepared on ITO, FTO and AZO substrates by RF magnetron sputtering technique and chemical bath deposition technique. The morphology, structure and optical properties of all samples were characterized by the scanning electron microscopy, X-ray diffraction and ultraviolet-visible spectroscopy. The results show that the microstructure of CdS thin films dependent on the type of substrate by different deposition techniques, the grain size is larger by chemical bath deposition technique, but the surface are relatively rough. All the prepared CdS thin films show a mixed phase structure of cubic and hexagonal. The diffraction peaks by sputtering is clear, sharp, and the crystalline is better than chemical bath deposition technique. The optical transmittance of CdS thin film by chemical bath deposition technique is inferior to those of CdS films by sputtering, but the advantage in the short wave direction is clearly.