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太赫兹金属双光栅超厚胶光刻工艺

Terahertz metal bi-grating fabrication using ultra-thick photoresist process

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摘要

介绍了制备某太赫兹频率真空辐射光栅的超厚胶光刻工艺,针对工艺中的难点(大厚度和高深宽比)展开了深入分析。实验分析了基片处理、涂胶、前烘、曝光、后烘、显影等工艺过程对光刻的影响,通过优化工艺参数,解决了胶膜脱落、开裂,不同胶层间的结合,光栅沟槽间的光刻胶残留等问题,成功制备了厚度为700 μm、深宽比为14的侧壁陡直、表面平整的双光栅结构胶膜。

Abstract

As a key part of terahertz vacuum electronic device, metal grating can’t be fabricated using traditional methods due to its tiny dimension. The photoetching process of metal bi-grating for radiation source at some terahertz band was presented. The influence of the procedure (including substrate preparation, spin-coating, pre-bake, exposure, post-bake and developing) on photoetching was analyzed experimentally. The problems such as film drop and crack, film’s combination and the photoresist remaining at gaps which were caused by thick film and high aspect ratio, were solved by the optimizing the process parameters. Finally, a good film microstructure with steep side wall and smooth surface was achieved, with a thickness of 700 μm and an aspect ratio of 14. The work presented in this paper provides a technological guide to the similarly related project.

Newport宣传-MKS新实验室计划
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中图分类号:TQ323;TN129

DOI:10.11884/hplpb201426.053102

所属栏目:研究快报

基金项目:中央高校基本科研业务费专项资金项目(2012HGQC0007)

收稿日期:2013-07-02

修改稿日期:2014-01-09

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单云冲:特种显示技术教育部重点实验室(合肥工业大学), 合肥 230009合肥工业大学 光电技术研究院, 合肥 230009合肥工业大学 仪器科学与光电工程学院, 合肥 230009
阮久福:特种显示技术教育部重点实验室(合肥工业大学), 合肥 230009合肥工业大学 光电技术研究院, 合肥 230009
杨军:特种显示技术教育部重点实验室(合肥工业大学), 合肥 230009合肥工业大学 光电技术研究院, 合肥 230009
邓光晟:特种显示技术教育部重点实验室(合肥工业大学), 合肥 230009合肥工业大学 光电技术研究院, 合肥 230009
吕国强:特种显示技术教育部重点实验室(合肥工业大学), 合肥 230009合肥工业大学 光电技术研究院, 合肥 230009

联系人作者:单云冲(syc.1112@163.com)

备注:单云冲(1988-),男,硕士研究生,从事太赫兹器件的微细加工技术研究

【1】刘盛纲, 钟任斌. 太赫兹科学技术及其应用的新发展[J]. 电子科技大学学报, 2009, 38(5): 481-486. (Liu Shenggang, Zhong Renbin. Recent development of terahertz science and technology and its applications. Journal of University of Electronic Science and Technology of China, 2009, 38(5): 481-486)

【2】Brooks J H, Dobbs R J, Joye C D, et al. Vacuum electronic high power terahertz sources[J]. IEEE Trans on Terahertz Science and Technology, 2011, 1(1): 54-75.

【3】冯进军, 廖复疆, 朱敏, 等. 微型真空电子器件技术研究[J]. 真空电子技术, 2005(6): 8-16. (Feng Jinjun, Liao Fujiang, Zhu Min, et al. Investigation of micro-vacuum electronic devices and technology. Vacuum Electronic Technology, 2005(6): 8-16)

【4】Lawrence I R. Microfabrication of high-frequency vacuum electron devices[J]. IEEE Trans on Plasma Science, 2004, 32(3): 1277-1291.

【5】Campo A, Greiner C. SU-8: A photoresist for high-aspect-ratio and 3D photolithography[J]. Micromech/Microeng, 2007, 21: 81-95.

【6】罗跃川, 张继成. 硅基支撑系统的光刻工艺[J]. 强激光与粒子束, 2012, 24(11): 2673-2676. (Luo Yuechuan, Zhang Jicheng. Photolithography process of Si support system. High Power Laser and Particle Beams, 2012, 24(11): 2673-2676)

【7】刘仁臣, 吴永刚, 夏子奂, 等. 湿法和溶脱法的亚μm ZnO: Al光栅制备[J]. 强激光与粒子束,2012, 24(11):2613-2617. (Liu Renchen, Wu Yonggang, Xia Zihuan, et al. Fabrication of submicro ZnO: Al gratings with wet etching and lift-off technology. High Power Laser and Particle Beams, 2012, 24(11): 2613-2617)

【8】张金娅, 陈迪, 朱军, 等. 超厚SU-8负胶高深宽比结构及工艺研究[J]. 功能材料与器件学报,2005, 11(2): 251-254. (Zhang Jinya, Chen Di, Zhu Jun, et al. Process study of high-aspect-ratio ultrathick SU-8 microstructure. Journal of Functional Material and Devices, 2005, 11(2): 251-254)

【9】张晔, 陈迪, 张金娅, 等. SU-8胶光刻工艺参数优化研究[J]. 微细加工技术, 2005(3): 36-41. (Zhang Ye, Chen Di, Zhang Jinya, et al. Process optimization of optical lithography of SU-8 photoresist. Microfabrication Technology, 2005(3): 36-41)

【10】Shin Y M, Barnett L R, Gamzina D, et al. Terahertz vacuum electronic circuits fabricated by UV lithographic molding and deep reactive ion etching[J]. Applied Physics Letters, 2009, 95: 181505.

【11】Joye C D, Calame J P, Garven M, et al. UV-LIGA microfabrication of 220 GHz sheet beam amplifier gratings with SU-8 photoresist[J]. Micromech Microeng, 2010, 20: 125016.

【12】Myasin Y A, Evdokimov V V, Il''yin A Y. 1-mm wavelength orotron with DRPS and broad electron beam[C]//Proc of 22nd International Crimean Conference on Microwave and Telecommunication Technology. 2012: 201-202.

【13】Lorenz H, Despont M, Fahrni N, et al. High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS[J]. Sensors and Actuators A: Physical, 1998, 64(1): 33-39.

【14】向鹏, 金春水, 张立超, 等. 极紫外多层膜残余应力初步研[J]. 强激光与粒子束,2005, 17(3):377-380. (Xiang Peng, Jin Chunshui, Zhang Lichao, et al. Control of residual stress in extreme ultraviolet multilayer coatings. High Power Laser and Particle Beams, 2005, 17(3):377-380)

引用该论文

Shan Yunchong,Ruan Jiufu,Yang Jun,Deng Guangsheng,Lü Guoqiang. Terahertz metal bi-grating fabrication using ultra-thick photoresist process[J]. High Power Laser and Particle Beams, 2014, 26(5): 053102

单云冲,阮久福,杨军,邓光晟,吕国强. 太赫兹金属双光栅超厚胶光刻工艺[J]. 强激光与粒子束, 2014, 26(5): 053102

被引情况

【1】孔维鹏,王度,郭超,陈晨,李赜宇,罗振飞,周逊. 光泵THz激光器复合型输出耦合镜的设计和研究. 强激光与粒子束, 2015, 27(4): 43102--1

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