利用磁控溅射设备, Mg0.04Zn0.96O陶瓷靶材, 以高纯的氮气与氩气混合气体作为溅射气体, 在石英衬底上沉积获得了N掺杂p型Mg0.07Zn0.93O薄膜, 薄膜的电阻率为21.47 Ω·cm, 载流子浓度为8.38×1016 cm-3, 迁移率为3.45 cm2/(V·s)。研究了该薄膜的结构与光学性能。实验结果显示, 其拉曼光谱中出现了位于272和642 cm-1左右与NO相关的振动模。低温光致发光光谱中, 可以观察到位于3.201, 3.384和3.469 eV的3个发光峰, 其中位于3.384 eV的发光峰归因为导带电子到缺陷能级的复合发光, 而位于3.469 eV的发光峰归因为受主束缚激子(A0X)的辐射复合, 这说明该N掺杂MgZnO薄膜的空穴载流子主要来自NO受主的贡献。

Using 99.99% pure nitrogen and argon as sputtering gas, p-type N doped Mg0.07Zn0.93O film was deposited on quartz substrate by radio frequency magnetron sputtering with Mg0.04Zn0.96O target. The film has resistivity of 21.47 Ω·cm, Hall mobility of 3.45 cm2/(V·s) and carrier concentration of 8.38×1016 cm-3.The structure and optical properties of this film were studied.The Raman peaks of the N for O site (NO) at 272 and 642 cm-1 were observed in the Raman spectrum. At the low tempe-rature (80 K), the photoluminescence spectrum of the p-type MgZnO∶N film showed three emission peaks centered at 3.201, 3.384 and 3.469 eV, respectively. The 3.384 eV peak should originate mainly from recombining by conducting electrons to the defect level while the 3.469 eV peak originated mainly from acceptor bound exciton (A0X) emission. It can be deduced that the p-type conduction of this N doped Mg0.07Zn0.93O film was primary attributed to NO acceptor defects.