在很多研究中，退火是提高ZnO薄膜晶体质量和改善其发光性能的有效方法。研究了脉冲激光沉积法(PLD)方法制备的ZnO薄膜退火后的发光特性，发现高温下和低温下生长的ZnO薄膜具有不同的发光特性。高温下生长的样品退火后以蓝光发射为主，而低温下生长的样品退火后以绿光发射为主。这主要是由于高温和低温下生长的样品具有不同的吸氧机理，并形成了不同的晶体缺陷，例如氧空位、锌间隙、代位氧、代位锌等。研究同时表明，PLD方法在生长过程中已经吸收了足够的氧原子并形成了致密的晶体结构，退火的方法并不总是改善薄膜的晶体质量和发光特性。这一点与其他方式形成的薄膜完全不同。

In many experiments, an nealing is aneffective method to improve the structural and optical characteristics of ZnO thin films. In this paper, the optical properties of annealed ZnO films fabricated by pulsed laser deposition (PLD) are studied. ZnO films grown at higher temperature and lower temperature have different oxygen absorption mechanisms and form different defects, oxygen vacancy and oxygen atom at the zinc position in the crystal lattice, OZn and Zn vacancy and Zn atom at the oxygen position in the crystal lattice, ZnO. They produce blue emission and green emission respectively. The results suggest that ZnO films fabricated by PLD in the oxygen ambient have absorbed plenty of oxygen atoms and have high-quality crystallinity. Annealing technical can not always improve the UV emission properties of the films but reduce them.