为了研究不同杂质颗粒物对划痕的影响及其大小与划痕形貌之间的关系，在钕玻璃抛光过程中分别引入三种尺寸的金刚砂、氧化铈团聚物和用过的抛光粉作为杂质颗粒物，对抛光过程中产生的划痕形貌进行统计分析。结果表明，脆性划痕、塑性划痕和混合型划痕都存在，其中脆性划痕占很大比例；氧化铈团聚物和用过的抛光粉产生的划痕浅且少，金刚砂产生的划痕深且多；随着金刚砂粒径的增大，对应产生的划痕的数密度和长度也增加；不同粒径的金刚砂产生的划痕的宽度分布与其对应的粒径分布相似，呈高斯状分布。利用T. Suratwala提出的黏弹性模型，探讨了钕玻璃抛光过程中划痕产生的机理，得到了划痕的宽度与长度都随着引入杂质颗粒物粒径的增大而增加的结论。

In order to study the effects of different rogue particles on the scratches, and establish the relationship between the rogue particle size and the scratch topography, experiments have been carried out. During the process of phosphate neodymium polishing, three different sizes of corundum, cerium oxide agglomerate and polished powder are introduced as rogue particles. Data of scratch topography is analyzed statistically. The results show that brittle scratches, plastic scratches and mixed scratches all exist, among which brittle scratches account for a large proportion; scratches caused by cerium oxide agglomerate and polished powder are shallow and few, while scratches caused by corundum are deep and many; the scratch density and scratch length caused by corundum of different sizes increase with the increasing of particle size; distribution of scratch widths caused by different sizes of corundum is similar to the distribution of the size of rogue particle, shown as Gaussian distribution. Using the model proposed by T. Suratwala, mechanism of scratch generating during phosphate neodymium glass polishing is investigated. It is illustrated that the width and length of scratches increase with the increasing of rogue particle size.