首页 > 论文 > 光学学报 > 35卷 > 1期(pp:0122005--1)

基于混合梯度下降的高性能光刻机离轴照明衍射光学元件设计

A Mixed Gradient Algorithm for High Performance DOE Design in Off-Axis Lithography Illumination System

  • 摘要
  • 论文信息
  • 参考文献
  • 被引情况
  • PDF全文
分享:

摘要

深紫外(DUV)光刻机照明系统普遍采用衍射光学元件(DOE)实现光瞳整形。根据光刻机的指标要求,衍射光学元件应具有高衍射效率和高均匀性的特点。传统的相位恢复算法如Gerchberg-Saxton (GS)及其改进算法,一般只能通过降低均匀性来提高衍射效率,无法得到最优的解。而全局优化算法如模拟退火法、遗传基因法等需要大量的计算时间,难以实现像素数目多的深紫外DOE 的设计。为了克服上述困难,提出了一种基于GS的混合梯度下降算法,在迭代过程中对每次迭代的振幅进行加权反馈修正,在加快收敛速度的同时,减少误差,同时实现高效率和高信噪比。利用该算法对光刻需要的传统、四极照明光瞳、定制照明光瞳的DOE 进行了设计,结果表明,实现传统和四极照明光瞳的16阶量化相位DOE 的衍射效率均超过92%, 而非均匀性分别为3.98%和2.3%。实现定制照明光瞳的DOE 的衍射效率为91%,图形恢复误差为5.8%。该方法为获得高性能深紫外DOE 提供一条可行的途径。

Abstract

The diffractive optical element (DOE) is widely used to generate various illumination pupils in the deep ultraviolet (DUV) projection lithography system. According to the specifications of DUV lithography machines, the designed DOE should possess high diffraction efficiency and high uniformity. Traditional algorithms such as Gerchberg- Saxton (GS) algorithm (GSA) and modified GSA get high diffraction efficiency with low non-uniformity. Global searching methods such as gene algorithm and simulated annealing algorithm need huge computing effort to receive high diffraction efficiency and high uniformity. To address these issues, a mixed gradient algorithm based on GSA is proposed. It can accelerate the rate of convergence and improve the signal to noise ratio simultaneously, and the phase retrieval image is improved. The DOEs generating conventional, quadrupole and customized illumination modes are designed and analyzed based on the proposed method, then the phase is quantized with 16 levels. The diffraction efficiency will reach 92%, and the non- uniformities of the proposed algorithm can reach 3.98% and 2.3% for the conventional and quadrupole illumination modes, respectively. The received efficiency for customized DOE is 91% , and its pattern recovery error is 5.8%. It provides a practical method of DOE design in projection lithography system.

广告组1 - 空间光调制器+DMD
补充资料

中图分类号:O438

DOI:10.3788/aos201535.0122005

所属栏目:光学设计与制造

责任编辑:韩峰  信息反馈

基金项目:国家科技重大专(2011ZX020402)、国家国际科技合作专项(2011DFR10010)、上海市青年科技英才扬帆计划(14YF1406300)

收稿日期:2014-07-01

修改稿日期:2014-08-30

网络出版日期:--

作者单位    点击查看

宋强:中国科学院上海光学精密机械研究所, 上海 201800中国科学院大学, 北京 100049
朱菁:中国科学院上海光学精密机械研究所, 上海 201800中国科学院大学, 北京 100049
王健:中国科学院上海光学精密机械研究所, 上海 201800中国科学院大学, 北京 100049
张方:中国科学院上海光学精密机械研究所, 上海 201800中国科学院大学, 北京 100049
吕向博:中国科学院上海光学精密机械研究所, 上海 201800中国科学院大学, 北京 100049
杨宝喜:中国科学院上海光学精密机械研究所, 上海 201800中国科学院大学, 北京 100049
黄惠杰:中国科学院上海光学精密机械研究所, 上海 201800中国科学院大学, 北京 100049

联系人作者:宋强(songqiang@siom.ac.cn)

备注:宋强(1987—),男,硕士研究生,主要从事光刻机光瞳整形技术和全息显示技术方面的研究。

【1】Hu Zhonghua, Yang baoxi, Zhu Jing, et al.. Pupil shaping techniques in high resolution projection exposure tools [J]. Laser & Optoelectronics Progress, 2011, 48(11): 111101.
胡中华, 杨宝喜, 朱菁, 等. 高分辨投影光刻机光瞳整形技术[J]. 激光与光电子学进展, 2011, 48(11): 111101.

【2】Guo Liping, Huang Huijie, Wang Xiangzhao. Off-axis illumination for optical lithography [J]. Laser Journal, 2005, 26(1): 23~25
郭立萍, 黄惠杰, 王向朝. 光学光刻中的离轴照明技术[J]. 激光杂志, 2005, 26(1): 23-15.

【3】Zhang Wei, Gong Yan. Vector analysis of diffractive optical elements for off-axis illumination of projection lithography system [J]. Acta Optica Sinica, 2011, 31(10): 1005002.
张巍, 巩岩. 投影光刻离轴照明衍射光学元件的矢量分析[J]. 光学学报, 2011, 31(10): 1005002.

【4】Hu Zhonghua, Yang Baoxi, Zhu Jing, et al.. Design of diffractive optical element for pupil shaping optics in projection lithography system [J]. Chinese J Lasers, 2013, 40(6): 0616001.
胡中华, 杨宝喜, 朱菁, 等. 用于投影光刻机光瞳整形的衍射光学元件设计[J]. 中国激光, 2013, 40(6): 0616001.

【5】Oliver Ripoll, Ville Kettunen, Hans Peter Herzig. Review of iterative Fourier-transform algorithms for beam shaping application [J]. Opt Eng, 2004, 43(11): 2549-2556.

【6】Zhang Wei, Gong Yan. Design of diffractive optical element for off- axis illumination in projection lithography [J]. Optics and Precision Enginneering, 2008, 16(11): 2081-2086.
张巍, 巩岩. 投影光刻离轴照明衍射光学元件设计[J]. 光学 精密工程, 2008, 16(11): 2081-2086.

【7】R W Gerchberg, W Q Saxton. A practical algorithm for determination of phase from image and diffraction plane pictures [J]. Optik, 1972, 35(2): 237-246.

【8】J R Fineup. Iterative method applied to image reconstruction and to computer generated holograms [J]. Opt Eng, 1980, 19(3): 297-306.

【9】F Wyrowski, O Bryndahl. Iterative Fourier-transform algorithm applied to computer holography [J]. J Opt Soc Am A, 1986, 5(7): 1058-1065.

【10】Yu Xiaochen, Hu Jiasheng, Wang Lianbao. New methods for improving the quality of laser beam shaping [J]. Chinese J Lasers, 2012, 39(1): 0116002.
于晓晨, 胡家升, 王连宝. 提高激光束整形质量的新方法[J]. 中国激光, 2012, 39(1): 0116002.

【11】Huang Lixin,Yao Xin, Cai Dongmei, et al.. A high accuracy and fast iterative algorithm for phase retrieval [J]. Chinese J Lasers, 2010, 37(5): 1218-1221.
黄利新, 姚新, 蔡东梅, 等. 一种快速高精度的相位恢复迭代算法[J]. 中国激光, 2010, 37(5): 1218-1221.

【12】J S Liu, M.R. Taghizadeh. Iterative algorithm for the design of diffractive phase element for laser beam shaping [J]. Opt Lett, 2002, 27(16): 1463-1465.

【13】Max Born, Emil Wolf. Principles of Optics [M]. Oxfordcity: Cambridge University Press, 1999. 512-512.

【14】Yang Liangliang, Cui Qingfeng, Liu Tao, et al.. Measurement of diffraction efficiency of diffractive optical elements [J]. Acta Optica Sinica, 2012, 32(4): 0412007.
杨亮亮, 崔庆丰, 刘涛, 等. 衍射光学元件衍射效率的测量[J]. 光学学报, 2012, 32(4): 0412007.

【15】Keiji Fuse, Takayuki Hirai, Toshihiko Ushiro, et al.. Design and performance of multilevel phase fan-out diffractive optical element for laser materials processing [J]. Journal of Laser Application, 2003, 15(4): 246-254.

【16】Lü Yanfei, Dong Yuan, Li Shutao, et al.. Modified algorithm for designing of diffraictive optical element to decrease the phase singular spots [J]. Acta Optica Sinica, 2012, 32(4): 0505001.
吕彦飞, 董渊, 李述涛, 等. 一种用于减少相位突变点的衍射光学元件改进设计方法[J]. 光学学报, 2012, 32(4): 0505001.

【17】Yin Shen, Tao Shaohua. Technique based on image superposition for optical image storage and reconstruction [J]. Acta Optica Sinica, 2013, 33(12): 1205002.
尹珅, 陶少华. 基于图像叠加的光学图像存储与恢复[J]. 光学学报, 2013, 33(12): 1205002.

【18】Christof Bodendorf, Ralph E Schlief, Ralf Ziebold. Impact of measured pupil illumination fill distribution on lithography simulation and OPC models [C]. SPIE, 2004, 5377: 1130-1145.

引用该论文

Song Qiang,Zhu Jing,Wang Jian,Zhang Fang,Lü Xiangbo,Yang Baoxi,Huang Huijie. A Mixed Gradient Algorithm for High Performance DOE Design in Off-Axis Lithography Illumination System[J]. Acta Optica Sinica, 2015, 35(1): 0122005

宋强,朱菁,王健,张方,吕向博,杨宝喜,黄惠杰. 基于混合梯度下降的高性能光刻机离轴照明衍射光学元件设计[J]. 光学学报, 2015, 35(1): 0122005

被引情况

【1】高龙,薛常喜,杨红芳,聂鑫. 偏心误差对长波红外波段多层衍射光学元件衍射效率的影响. 光学学报, 2015, 35(6): 623004--1

【2】王佳舟,庞辉,张满,史立芳,曹阿秀,邓启凌. 一种适用于多波长的衍射元件设计方法. 光学学报, 2015, 35(10): 1005002--1

【3】江海波,邢廷文. 一种增大工艺窗口的光源优化方法. 激光与光电子学进展, 2015, 52(10): 101101--1

【4】毛珊,崔庆丰. 双层衍射元件加工误差对带宽积分平均衍射效率的影响. 光学学报, 2016, 36(1): 105001--1

【5】陈琪,李国俊,方亮,周崇喜. 亚波长多台阶结构大角度激光分束器设计. 中国激光, 2016, 43(2): 205006--1

【6】谢桂捷,范长江,杨鑫,邵杰. 均光消色散光束整形薄膜器件的研究. 中国激光, 2017, 44(5): 503001--1

【7】程伟林,张方,林栋梁,曾爱军,杨宝喜,黄惠杰. 光刻机照明系统的多自由度均匀性校正方法. 光学学报, 2018, 38(10): 1022004--1

【8】李美萱,李 宏,张斯淇,张文颖,郭 明. 基于离散抽样加密算法的衍射光学元件设计. 红外与激光工程, 2019, 48(9): 916004--1

【9】李美萱,董连和. 浸没式光刻照明系统中会聚镜的设计及公差分析. 应用光学, 2019, 40(5): 876-881

您的浏览器不支持PDF插件,请使用最新的(Chrome/Fire Fox等)浏览器.或者您还可以点击此处下载该论文PDF