为了实现高成像要求，投影光刻物镜在设计时需要考虑膜层偏振效应的影响，并进行相应的分析和评价。首先介绍了基于琼斯矩阵的偏振像差理论，然后以一个数值孔径（NA）为0.75的投影光刻物镜为例，设计了相应膜系，系统分析了膜层引入的偏振像差，并在设计时对膜层引入的离焦项和球差项进行了间隔优化补偿，补偿前后标量波像差和质心畸变分别从68.92 nm 和3.76 nm 改善为1.08 nm 和0.38 nm，偶极照明模式下90 nm 密集线条对比度从0.082 提高为0.876，在此基础上，提出在设计时根据不同表面的入射角分布情况，采用组合膜系，同时控制P光和S光的振幅和相位分离，减小膜系引入的延迟和二次衰减等偏振像差，使得线条对比度提高了1.1%。

In order to achieve high imaging requirement of projection lithography lens, the impact of polarization effects induced by coatings need to be considered and analyzed during the design process.Polarization aberration theory based on the Jones matrix is first described, then the polarization aberration of a numerical aperture (NA) of 0.75 projection lithography lens with corresponding coating is analyzed as an example. The large power and spherical aberrations induced by the coating are compensated with space and focus optimization. The scalar aberration and point spread function distortion are improved from 68.92 nm and 3.76 nm to 1.08 nm and 0.38 nm, respectively. The contrast of 90 nm dense line also increases from 0.082 to 0.876. Based on this, a method to reduce polarization aberration introduced by coating is represented, such as retardation and diattenuation. Combined films are used to control the magnitude and phase separation of the P and S component simultaneously. With this method, the contrast of the 90nm dense line is improved by 1.1%.