衍射波前质量是刻划光栅的重要性能指标之一，对于机械刻划光栅，刻划机的刻线定位精度直接影响光栅的波前质量。建立了刻划机固有存在的刻线位置和转角误差与光栅衍射波前误差间的数学关系，分析了各误差对衍射波前质量的影响。针对该误差设计了一种基于双频激光干涉测量的刻划机刻线位置和转角误差测量的光路，并提出了一种主动控制技术，即采用单压触动器校正刻线位置和转角误差的方法。根据该校正方法设计了刻划机的双层光栅承载工作台结构，并进行了尺寸为80 mm×60 mm、刻线密度为194 line/mm 的光栅刻划实验。实验结果表明，刻划光栅的衍射波前误差由0.23λ 降低至0.093λ (λ = 632.8 nm) ，并且原子力显微镜测试光栅刻槽质量符合理论设计要求。

Diffracted wave- front quality is one of the most important performance indexs for ruled gratings. For mechanically ruled gratings, positioning accuracy of the groove directly affects the wave- front quality of the gratings. The mathematical relationship between the inherent errors of the ruling machine which including the error of groove position, error of yaw and wave-front error of the gratings is developed, and the impact of various errors on the wave- front quality is analyzed. According to the error of groove position and error of yaw, a measure optical path is designed based on double-frequency laser interference, and a method to correct the error of groove position and error of yaw is proposed using piezoelectric actuator. According to the correction method, a double workbench is designed, and the ruling experiments for the size of 80 mm × 60 mm and groove density of 194 line/mm are carried out. The results show that the diffracted wave-front error of the ruled grating is reduced from 0.23λ to 0.093λ (λ = 632.8 nm) , and testing quality of the groove by atomic force microscope meets the requirement of the theoretical design.