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高光能利用率极紫外光刻波纹板照明系统设计

Optical Design of High-Efficiency Ripple Plate Illuminator for EUV Lithography

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摘要

针对极紫外光刻照明系统光能利用率低的问题,设计了一套高光能利用率极紫外光刻波纹板照明系统。该系统中波纹板面形采用柱面镜阵列,降低了加工难度;并且根据波纹板反射光线的特性,确定了由修正型复合抛物面聚光镜与二次曲面反射镜组作为中继镜组的结构。整个系统仅采用四片反射镜且其中两片反射镜为掠入射,与传统的极紫外光刻照明系统相比,有效地提高了系统的光能利用率。对一套数值孔径0.33 的极紫外光刻投影物镜,给出了与之相匹配的波纹板照明系统设计实例。仿真结果表明,系统的光能利用率可达39.7%,掩模上弧形照明区域扫描方向的积分不均匀度小于2.7%,验证了该设计的可行性和有效性。

Abstract

A high- efficiency ripple plate illumination system for extreme ultraviolet (EUV) lithography is proposed. A cylindrical mirrors array is used as ripple plate mirror to simplify the system. By analyzing the characteristics of reflection on ripple plate, we design a relay system with a modified compound parabolic concentrator and two conic mirrors to reduce the efficiency loss caused by excessive number of reflective mirrors. Compared with the traditional EUV lithography illumination system, it greatly improves the system′ s efficiency. A design example for a numerical aperture (NA) 0.33 projection objective is given and the efficiency of the illuminator is 39.7% while the slit non- uniformity of the scanning energy distribution is 2.7% in a prescribed arc area, which proves the feasibility of the design.

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中图分类号:TN305.7

DOI:10.3788/aos201535.0322005

所属栏目:光学设计与制造

责任编辑:韩峰  信息反馈

基金项目:国家科技重大专项(2012ZX02702001-002)

收稿日期:2014-09-22

修改稿日期:2014-10-25

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作者单位    点击查看

梁欣丽:北京理工大学光电学院光电成像技术与系统教育部重点实验室, 北京 100081
李艳秋:北京理工大学光电学院光电成像技术与系统教育部重点实验室, 北京 100081
梅秋丽:北京理工大学光电学院光电成像技术与系统教育部重点实验室, 北京 100081

联系人作者:梁欣丽(bitliangxinli@163.com)

备注:梁欣丽(1990—),女,硕士研究生,主要从事极紫外光刻照明系统设计方面的研究。

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【2】David C Brandt, Igor V Fomenkov, Nigel R Farrar, et al.. LPP EUV source readiness for NXE 3300B [C]. SPIE, 2014, 9048: 90480C.

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【5】Henry N Chapman, Keith A Nugent. Novel condenser for EUV lithography ring-field projection optics [C]. SPIE, 1999, 376.7: 225-236.

【6】Toshihiko Tsuji. Illumination System, Projection Exposure Apparatus and Device Manufacturing Method: U.S.,2003/0031017[P]. 2003-02-13.

【7】Toshihiko Tsuji. Illumination Optical System and Exposure Apparatus: U.S.,2005/0057737 [P]. 2005-03-17.

【8】Toshihiko Tsuji. Illumination Optical System and Exposure Apparatus:U.S.,2005/0057738 [P]. 2005-03-17.

【9】Kazuhiko Kajiyama, Toshihiko Tsuji. Illumination Optical System and Exposure Apparatus Including the Same: U.S., 7538856 B2[P]. 2009-03-26.

【10】William L Eichhorn. Generalized conic concentrators [J]. Appl Opt, 1982, 21 (21): 3887-3890.

【11】Qiuli Mei, Yanqiu Li, Fei Liu. A reverse design method for EUV lithography illumination system [C]. SPIE, 2013, 8679: 867923.

引用该论文

Liang Xinli,Li Yanqiu,Mei Qiuli. Optical Design of High-Efficiency Ripple Plate Illuminator for EUV Lithography[J]. Acta Optica Sinica, 2015, 35(3): 0322005

梁欣丽,李艳秋,梅秋丽. 高光能利用率极紫外光刻波纹板照明系统设计[J]. 光学学报, 2015, 35(3): 0322005

被引情况

【1】张 超,张杰瑞,王一名,匡尚奇,谢 耀. 基于量子进化算法的宽角度极紫外多层膜设计. 光学学报, 2017, 37(6): 631001--1

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