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有像差情况下的全息光栅拼接研究

Study of Gratings Tiled by Holographic Exposure with Wave Aberration

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摘要

激光约束核聚变系统需要大口径脉冲压缩光栅。全息光栅拼接法是制造大口径光栅的重要手段。针对有像差的全息曝光系统,提出了一种拼缝处光栅对准拼接方法。为研究像差对光栅拼接特性的影响,用随机波面进行了光栅模拟拼接,计算了远场衍射能量分布与拼接误差的关系。实验拼接了(150+150)×200 mm2口径光栅,其拼接均方根误差值为0.034λ,峰-峰误差值为0.110λ。利用光栅±1 级衍射波面,计算得到了曝光系统像差,并模拟了拼缝处最小拼接误差,其均方根误差值为0.016λ,峰-峰误差值为0.105λ。结果表明,拼接误差与理论模拟结果相近。该误差不会造成远场衍射光斑能量明显下降。由此证明了该方法的可行性。

Abstract

Large-aperture pulse compression gratings are needed by laser confinement fusion system. Tiled-grating made by holographic exposure is an important way to manufacture large aperture gratings. A method is proposed to align the gratings for the exposure system with wave aberration. In order to study the effect of the wave aberration on the characteristics of tiled-grating, the random wave fronts are used to simulate the tiled-gratings. The relationship between the distribution of far-field diffraction energy and the tiling-error is calculated. A grating of (150+150)×200 mm2 is made experimentally. The root-mean-square value of the tiling-error is 0.034λ and the peak to peak value is 0.110λ. The ± 1st diffraction wave fronts of the grating are used to calculate wave aberration of the exposure system. The minimum value of the tiling-error is simulated theoretically. The root-mean-square value of the error is 0.016λ and the peak to peak value is 0.105λ. The results show that the tiling-error is close to the simulated data. The far-field diffraction intensity can not be decreased obviously by the tiling-error. It is proved that the method proposed in this article is feasible.

Newport宣传-MKS新实验室计划
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中图分类号:O436

DOI:10.3788/aos201535.0305002

所属栏目:衍射与光栅

基金项目:国家自然科学基金(61178046,60808013)、江苏省高校自然科学研究重大项目(11KJA14001)、江苏高校优势学科建设工程资助项目、苏州市应用基础研究项目(SYG201115)

收稿日期:2014-09-17

修改稿日期:2014-10-29

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钱国林:苏州大学物理与光电·能源学部苏州纳米科技协同创新中心, 江苏 苏州 215006苏州市职业大学电子信息工程学院, 江苏 苏州 215104
吴建宏:苏州大学物理与光电·能源学部苏州纳米科技协同创新中心, 江苏 苏州 215006
李朝明:苏州大学物理与光电·能源学部苏州纳米科技协同创新中心, 江苏 苏州 215006
陈新荣:苏州大学物理与光电·能源学部苏州纳米科技协同创新中心, 江苏 苏州 215006
邹文龙:苏州大学物理与光电·能源学部苏州纳米科技协同创新中心, 江苏 苏州 215006

联系人作者:钱国林(qgl_jy@jssvc.edu.cn)

备注:钱国林(1980—),男,博士研究生,讲师,主要从事光信息器件与微纳制造方面的研究。

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