光学学报, 2015, 35 (4): 0416004, 网络出版: 2015-04-08
光子晶体负折射材料中缺陷对成像质量的影响
Effects on Imaging Quality of Defects in the Photonic Crystal with Negative Refraciton Material
材料 光子晶体 负折射 缺陷 时域有限差分法 成像质量 materials photonic crystal negative refraction defects finite difference time domain imaging quality
摘要
利用硅介质柱在空气中周期性排列构成六角结构的光子晶体平板,并在晶体平板中引入不同构型的缺陷,通过改变缺陷介质柱的半径和缺陷中心位置探讨引入缺陷对成像质量产生的影响。时域有限差分法模拟结果表明:介质柱半径和位置的改变,能使光的透射率提高,增加像方的强度。由于缺陷的引入,缺陷之间的相互干扰会降低成像的分辨率。
Abstract
Silicon columns are arranged periodically to constitute a photonic crystal slab with hexagonal structure in the air medium, and different configurations of defects are introduced in the photonic crystal slab. The effects on imaging quality are mainly discussed by changing the radius of the defect dielectric column and the center position of defects. Through the method of finite difference time domain, simulation results show that the change of dielectric column radius and the position of defects can increase the transmittance of light and enhance the image intensity. Due to the introduction of defects, the interference between the defects can reduce the resolution of the imaging.
刘逢芳, 朱兆杰, 童元伟. 光子晶体负折射材料中缺陷对成像质量的影响[J]. 光学学报, 2015, 35(4): 0416004. Liu Fengfang, Zhu Zhaojie, Tong Yuanwei. Effects on Imaging Quality of Defects in the Photonic Crystal with Negative Refraciton Material[J]. Acta Optica Sinica, 2015, 35(4): 0416004.