为了满足微米量级印刷电路板(PCB)光刻的需求，提出了一种新型PCB 数字光刻投影成像技术。利用ZEMAX 光学设计软件设计并优化了双高斯结构型光刻投影物镜。该物镜具有双远心结构,可以避免数字微反射镜(DMD)偏转产生离焦，分辨率可达13.68 mm，数值孔径NA=0.045，焦深为200 mm，严格控制像面畸变量小于0.03%。采用DMD 多光束倾斜扫描技术，将DMD 旋转一定的角度，利用曝光点的位置与光斑重叠积分能量的多少，形成更小的像素尺寸，提高了网格精度。基于该投影成像技术进行了光刻实验，实验结果证实了该投影成像技术的可行性，通过控制网格精度既能实现整数像素以外的线宽又能提高图像的分辨率和光刻效率。

For meeting the requirements of micron printed circuit board (PCB) lithography, a novel PCB projection imaging digital lithography technology which designs and optimizes the double Gauss type structural lithography projection lens based on ZEMAX optical design software has been proposed. The lens has double telecentric structure and can avoid defocus caused by digital micro- mirror device (DMD) deflection. Its resolution is 13.68 mm, numerical aperture NA is 0.045, depth of focus is 200 mm and image plane distortion is controlled strictly below 0.03%. The lens also uses DMD multi-beam inclined scanning technology, rotating DMD with fixed angle round and forming smaller pixel size by utilizing the position of exposure point and light spot overlap integral energy, which raises mesh precision; since this projection imaging technology is based on lithography experiments proving feasibility of the projection imaging technology, besides integer pixel, the noninteger pixel line width can be obtained and image resolution and production can also be improved by controlling mesh precision.