光刻空间像仿真作为各种计算光刻技术的基础,受到越来越多的重视.提出一种基于互强度傅里叶分析的光刻机投影成像快速模拟方法,从光刻成像互强度传播过程入手,基于傅里叶光学原理对成像要素进行多次空域-频域变换,得到一种快捷的空间像模拟途径.通过与标准解析空间像对比,发现该方法的计算精度可达10-4(最大光强归一化).该方法避免了部分相干成像的Hopkins方程中繁琐的积分运算,操作性强、计算精度高.该方法适用于各种灵活多变的曝光成像条件,具备广阔的工程应用前景.

As basis of various computational lithography techniques,simulating aerial images in optical lithographic systems has drawn more and more attentions.A method of simulating projection images in optical lithographic systems based on Fourier analysis of mutual intensities is proposed in this paper.On basis of Fourier optics principle,this paper starts from the propagation of mutual intensities.By performing multi-transforms of imaging elements from space domain to frequency domain,an approach for conveniently simulating aerial images is obtained.By comparing simulated aerial images with analytical standard ones,it is found that the calculation accuracy of this method can achieve 10-4 (the maximum intensity is normalized to 1).Due to avoiding calculation of complex integral in Hopkins function representing partially coherent imaging,this method is easy to be performed with high calculation accuracy.This method is suitable for flexible multiple projection imaging conditions,and has a good future for wide engineering applications.