设计了一种基于非晶硅的太阳电池新结构。在所设计的结构中，减反膜由双层光栅构成。硅(Si)薄膜被刻蚀成阵列菲涅耳波带片(非周期性光栅)结构，可以使得光聚焦到非晶硅薄膜中, 并且可以节约Si 材料的用量。Si 薄膜上的氧化铟锡(ITO)薄膜被刻蚀成亚波长、无规则的光栅阵列结构。所设计的双光栅减反膜可以减少光的反射、增加光的宽带透射。使用时域有限差分(FDTD)方法模拟了反射和透射场的强度分布。模拟结果显示，与无光栅的常规非晶硅薄膜太阳电池相比，所设计的太阳电池结构可以将光的吸收率提高39.2%，短路光电流密度提高19.9%，这些结果优于文献中所报道的具有周期性双光栅减反膜结构的太阳电池的性能。

A new amorphous silicon film solar cell structure is designed, where the antireflective coating consists of double layer gratings. The Si film is etched into the array of Fresnel zone plate (nonperiodic grating) structure to focus light to the amorphous silicon film and amount of Si can be saved. The indum tin otide (ITO) film on Si is etched into a subwavelength and nonperiodic grating array. The designed double grating antireflective film can reduce refraction and increase the broadband transmission of light. The intensity distribution of reflection and transmission fields are simulated by using the finite difference time domain (FDTD) method. The simulation results show that, compared with the conventional amorphous silicon film solar cell without grating antireflective film, the absorptivity of light and the short-circuit photocurrent density can be improved by 19.9% and 19.9%, respectively. These results are better than results of the reported solar cell with an antireflective film of double layer periodic gratings and a metal grating back electrode.