激光与光电子学进展, 2015, 52 (6): 062201, 网络出版: 2015-06-03  

极紫外辐照损伤测试系统光学仿真研究

Optical Simulation Research on Damage Testing System of Extreme Ultraviolet Radiation
作者单位
1 中国科学院光电研究院, 北京 100094
2 中国科学院大学, 北京 100049
摘要
为了科学地筛选极紫外光刻机所用的材料和工艺,需要建立极紫外辐照损伤测试系统、开展真空极紫外辐照下各种材料的损伤实验。极紫外辐照损伤测试系统主要包括极紫外光源、收集镜腔室和样品腔室。对极紫外辐照损伤测试系统进行了光学仿真,得到了像面在焦点处、像面离焦、收集镜平移、收集镜旋转等情况下的仿真结果。仿真结果表明:该极紫外辐照损伤测试系统焦深约为±3 mm;当像面上光斑半峰全宽基本不变时收集镜允许最大平移距离为±1.2 mm、允许最大转动转角为±0.08°;当收集镜小角度旋转时,像面上光斑沿单一方向平移,且平移距离和旋转角度成比例关系。该仿真研究对搭建极紫外辐照损伤测试系统、进行极紫外辐照损伤测试具有重要指导意义。
Abstract
Damage testing system of extreme ultraviolet radiation, which is set to filter reasonably the materials and manufacturing processes for extreme ultraviolet lithography, consists of extreme ultraviolet source, collector chamber and sample chamber. Simulations of the damage testing system is provided when image plane is at focus and out of focus, and when the ellipsoidal collector is moving and rotating. The simulation results show that depth of focus in this system is ±3 mm. When there is no typical change of average image size in image plane, the maximum moving distance of collector is ±1.2 mm and the maximum rotation angle is ±0.08°. When the collector rotates by a small angle, the image moves along a certain orientation and image moving distance is directly proportional to collector rotation angle. The results are instructive to build the damage testing system of extreme ultraviolet radiation and implement the testing.

陈进新, 吴晓斌, 王宇. 极紫外辐照损伤测试系统光学仿真研究[J]. 激光与光电子学进展, 2015, 52(6): 062201. Chen Jinxin, Wu Xiaobin, Wang Yu. Optical Simulation Research on Damage Testing System of Extreme Ultraviolet Radiation[J]. Laser & Optoelectronics Progress, 2015, 52(6): 062201.

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