强激光与粒子束, 2015, 27 (6): 061004, 网络出版: 2015-06-17  

HF酸腐蚀提高K9基板损伤阈值

Improve K9 glass substrate damage threshold by HF etching
曹翀 1,2,*张锦龙 1,2
作者单位
1 同济大学 物理科学与工程学院,精密光学工程技术研究所, 上海 200092
2 同济大学 先进微结构材料教育部重点实验室, 上海 200092
摘要
针对K9玻璃基板的HF酸化学腐蚀工艺开展研究,标定了40%和2%高低两种体积分数的HF酸的腐蚀速率;分析了基板表面形貌随腐蚀深度的变化规律;研究了腐蚀时间、HF酸体积分数、超声波工艺对激光损伤阈值的影响,提出了能够有效减少损伤敏感的氟硅盐沉淀、提高损伤阈值的优化腐蚀清洗工艺流程.采用优化的腐蚀清洗工艺流程进行了实验验证,结果表明用体积分数为2%的HF酸在高温和超声波条件下腐蚀90 s后,测得1064 nm波长激光作用下K9基板抗激光损伤阈值提高了75%.
Abstract
This paper carries out researches on the chemical etching of HF acid on K9 substrates and calibrates the etching rate of HF acid under the concentration of 40% and 2%.The relationship between surface morphology of substrate and etching depth is analyzed and the effect of etching time,concentration of HF acid,ultrasonic cleaning on the LIDT is investigated.The optimized etching cleaning process which can reduce the deposition of silicate effectively and improve the LIDT is proposed.Finally,the optimized etching cleaning process is used to test and verify the experimental results.The results indicate that under the irradiation of 1064 nm laser,the LIDT of K9 substrates etched for 90s under the condition of high temperature and ultrasonic with 2% concentration HF acid is 75% higher than the original one.

曹翀, 张锦龙. HF酸腐蚀提高K9基板损伤阈值[J]. 强激光与粒子束, 2015, 27(6): 061004. Cao Chong, Zhang Jinlong. Improve K9 glass substrate damage threshold by HF etching[J]. High Power Laser and Particle Beams, 2015, 27(6): 061004.

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!