激光生物学报, 2013, 22 (5): 397, 网络出版: 2015-07-23  

基于光子学技术研究弱光胁迫早期拟南芥光合损伤机理

Mechanism Study of Photodamage to Photosystem during the Early Stages of Low Light Stress by Photonic Technique in Arabidopsis thaliana
作者单位
华南师范大学生物光子学研究院激光生命科学研究所、暨激光生命科学教育部重点实验室, 广东 广州 510631
摘要
弱光限制植物的光合作用, 降低了光合作用效率, 造成农业产量下降。本文主要研究了弱光处理早期, 拟南芥光合作用相关指标的变化。研究中发现在弱光处理的早期, 植株生长表型和最大光化学效率(Fv/Fm)没有明显变化, 实际光化学效率Y(II) 以及光系统电子传递效率(ETR)下降较明显。此外, 弱光处理原生质体, 利用2′, 7′-二氯二氢荧光素二乙酯(dichlorofluorescin diacetate, H2DCF-DA)染色, 共聚焦显微镜观察, 发现细胞中有较明显的活性氧(ROS)合成, 且定位于叶绿体。该研究结果为植物弱光耐受性的研究提供理论依据。
Abstract
Low light limits photosynthesis by reducing the efficiency of photosynthesis in plants, thus causes the loss of agricultural production. Using photonic technique, the photodamage to photosystem under low light conditions were mainly studied, We found that plant growth phenotype and maximum light quantum yield (Fv/Fm) did not change significantly, the actual light quantum yield Y (II) and photosystem electron transfer efficiency (ETR) dropped more apparently during the early stages of low light stress. In addition, when protoplast were treated with low light, and then loaded with 2′, 7′-dichloro dihydrogen fluorescein diethyl (dichlorofluorescin diacetate, H2DCF-DA), a strong reactive oxygen species (ROS) accumulation could be detected, and which were mainly located in the chloroplast using laser scan confocal microscopy.The data may provide theoretic foundation for further studying the mechanism of low light tolerance in Arabidopsis thaliana.

王永强, 孙爱珍, 曾礼漳. 基于光子学技术研究弱光胁迫早期拟南芥光合损伤机理[J]. 激光生物学报, 2013, 22(5): 397. WANG Yongqiang, SUN Aizhen, ZENG Lizhang. Mechanism Study of Photodamage to Photosystem during the Early Stages of Low Light Stress by Photonic Technique in Arabidopsis thaliana[J]. Acta Laser Biology Sinica, 2013, 22(5): 397.

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