采用射频磁控溅射技术在Si(111)基片上制备金属锰膜, 用椭圆偏振光谱在2.0~4.0eV光子能量范围内研究了溅射压强对锰膜光学性质的影响.分别用德鲁得-洛伦兹模型以及有效介质模型对椭偏参数进行拟合, 结果表明随压强增大薄膜致密度先增大后减少; 折射率随压强增大先减少后增大; 而消光系数随压强的变化与光子能量有关, 在低能量区变化复杂, 高能量区随压强增加与折射率规律一致.分析表明上述变化与薄膜的致密度密切相关.

Spectroscopic ellipsometry was used to investigate the optical properties of Mn film deposited with different sputtering pressures on silicon substrates in the photo energy range of 2.0~4.0eV. Parameterized analyses, based on Drude-Lorenz model and Bruggeman effective-medium approximation model, were used to fitting the elliptic parameters. The results imply that the density of Mn films first increases and then decreases with increasing of Ar pressure, whereas the refractive index changes with Ar pressure in a contrary way. Meanwhile, the extinction coefficient has a complex relationship with Ar pressure at lower photo energy, the extinction coefficient changes in line with the refractive index when photo energy exceeds 2.8eV. Moreover, the effects of Ar pressure on optical constant of the film depend strongly on the variation of the Mn atomic density.