光学 精密工程, 2015, 23 (6): 1673, 网络出版: 2015-08-25   

双工件台宏微交接系统设计及实验

Design and test of macro-micro coupling system for dual-stage lithography
作者单位
哈尔滨工业大学 超精密光电仪器工程研究所, 黑龙江 哈尔滨 150080
摘要
为了减少光刻机双工件台换台的时间, 保证宏动系统与微动台的可靠连接, 设计了一种双工件台快速宏微交接系统。基于柔性杠杆机构设计系统的快速抓卡装置以保证结构的紧凑性, 并对其锁紧力进行了分析; 设计的抓卡装置中的柔性机构包括柔性杠杆及下夹板回复单元, 采用有限元方法对其进行了分析。设计了快速抓卡装置的充放气回路; 为了保证抓卡装置锁紧时的速度和安全性, 气动系统可实现抓卡装置锁紧的3个动态过程, 从而完成抓紧装置的缓冲锁紧。最后, 搭建了抓卡装置下夹板运动测量实验平台和锁紧力测量实验平台。实验结果表明: 抓卡装置下夹板的运动行程大于2 mm, 能够保证宏动系统和微动台交接过程的安全性。抓卡装置的开启时间为350 ms, 快速缓冲锁紧时间为850 ms, 可承载的X向驱动力大于700 N。该系统满足双工件台工作及换台过程对可靠性和快速性的要求。
Abstract
To reduce the swap time of wafer stage in a dual-stage lithography, and to guarantee the connection reliability between a long stroke system and the wafer stage, a macro-micro coupling system of dual-stage lithography was designed. On the basis of compliance mechanical theory, the fast gripper of coupling system was designed to realize the compactedness of the system, and its locking force was analyzed. A flexible mechanism of the fast gripper was designed, including a flexible lever and a clamp reset unit, then they were analyzed by finite element method. The pneumatic system in the fast gripper was designed. To guarantee the rapidity and safety in the locking process of coupling device, the pneumatic system could realize three dynamic locking process, and complete the buffer locking of the fast gripper. Finally, the experiments of clamp motion test and the clamping force test were performed. Experimental results indicate that the stroke of the clamp is greater than 2 mm, which meets the safety needs of stroke system and wafer stage. Moreover, the opening time and fast buffer closing time of the clamp coupling mechanism are 350 ms and 850 ms respectively, and can bear X direction driving force more than 700 N. The coupling system ensures the reliability of the working process and rapidity of wafer stage swap process.

吴剑威, 袁勇, 崔继文, 刘永猛, 谭久彬. 双工件台宏微交接系统设计及实验[J]. 光学 精密工程, 2015, 23(6): 1673. WU Jian-wei, YUAN Yong, CUI Ji-wen, LIU Yong-meng, TAN Jiu-bin. Design and test of macro-micro coupling system for dual-stage lithography[J]. Optics and Precision Engineering, 2015, 23(6): 1673.

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