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扫描干涉场曝光中关键技术的现状与发展趋势

Status and Development of Scanning Beam Interference Lithography System

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摘要

扫描干涉场曝光(SBIL)在制作大尺寸、纳米精度的衍射光栅中有着独特的优势。为了充分了解SBIL 系统的技术特点,介绍了国内外SBIL 技术的发展现状,并针对SBIL 系统中的各个关键技术进行技术性的调研与总结,着重分析了各关键技术已有解决方法的基本原理、优点以及存在的局限性,结合具体的光栅应用要求,给出了各关键技术的相应具体指标,展望了其发展趋势。

Abstract

Scanning beam interference lithography (SBIL) is advantageous to produce large-area linear diffraction gratings that are phase-accuracy to nanometer level. In order to comprehend the merits of SBIL, the research progress on SBIL both in China and abroad are introduced, and the key technologies in SBIL are summarized from the merits and limitation of the scheme and principle. And then for the application of the specific grating, parameters of the key technologies in SBIL are presented. The development of SBIL is forecasted.

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中图分类号:O436.1

DOI:10.3788/lop52.100001

所属栏目:综述

基金项目:国家国际科技合作项目(2011DFR10010)、国家科技重大专项课题(2011ZX02402)、上海市科技人才计划项目(14YF1406300)

收稿日期:2015-04-09

修改稿日期:2015-05-08

网络出版日期:2015-09-02

作者单位    点击查看

程伟林:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800中国科学院大学, 北京 100049
朱菁:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800中国科学院大学, 北京 100049
张运波:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800
曾爱军:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800中国科学院大学, 北京 100049
黄惠杰:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800

联系人作者:程伟林(jiping111@163.com)

备注:程伟林(1986—),男,博士研究生,助理研究员,主要从事光电检测方面的研究。

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引用该论文

Cheng Weilin,Zhu Jing,Zhang Yunbo,Zeng Aijun,Huang Huijie. Status and Development of Scanning Beam Interference Lithography System[J]. Laser & Optoelectronics Progress, 2015, 52(10): 100001

程伟林,朱菁,张运波,曾爱军,黄惠杰. 扫描干涉场曝光中关键技术的现状与发展趋势[J]. 激光与光电子学进展, 2015, 52(10): 100001

被引情况

【1】刘兆武,李文昊,巴音贺希格,宋莹,姜珊,李晓天,吕强. 扫描曝光系统中二维工作台x轴测量镜的面形在线检测. 中国激光, 2017, 44(1): 104004--1

【2】王玮,姜珊,宋莹,巴音贺希格. 扫描干涉场曝光系统光斑尺寸与光路设计. 中国激光, 2017, 44(9): 905002--1

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