激光与光电子学进展, 2015, 52 (10): 103003, 网络出版: 2015-10-08
热丝CVD沉积金刚石薄膜过程中的发射光谱研究
Analysis of Optical Emission Spectroscopy in Diamond of Hot Filament Chemical Vapor Deposition
薄膜 热丝化学气相沉积 金刚石薄膜 丙酮/氢气/氩气等离子体 发射光谱 thin films hot filament chemical vapor deposition diamond thin film plasma of acetone/H2/Ar optical emission spectroscopy
摘要
发射光谱(OES)是对等离子体过程进行检测和诊断最常用的方法,利用等离子体发射光谱,在甲烷/H2/Ar 和丙酮/H2/Ar 两种碳源体系下,对热丝化学气相沉积(HFCVD)金刚石薄膜过程进行了等离子体原位在线测量,研究了两种碳源下等离子体内部各基团种类、强度的差异,以及气压对丙酮体系中各种基团的强度影响。结果表明,两种碳源下主要的基团种类基本相同,但基团谱线差异非常明显。丙酮体系中CH 谱线最尖锐,并且无H2谱线,Ha随气压的增加而减小,其他基团均在3.5 kPa 附近出现最大值;CH4 体系中Ha 谱线强度最大,出现H2 谱线;Ar 基团在两个体系中出现谱峰所对应波长不一样,其中在丙酮系统中为433.36 nm,在CH4体系中为794.8 nm。
Abstract
Optical emission spectroscopy (OES) is an effective method for plasma measuring and diagnosing. OES is used to in-situ measure the hot filament chemical vapor deposition (HFCVD) plasma of acetone/H2/Ar system and methane/H2/Ar, respectively. The type, intensity and the influence of carbon source classes, especially the pressure for acetone/H2/Ar on the spatial distribution in HFCVD plasma are investigated. The results show that main groups are basically the same under different carbon sources, but the differences of spectral distribution are obvious. In acetone system, the intensity of CH is the largest, and there is no H2 spectral lines. Ha line decreases with increasing the pressure, and other groups have a maximum value at nearly of 3.5 kPa. However,in methane system, H2 spectral line is obvious and the intensity of CH is the largest. Ar groups in two systems appear differently in spectral peak corresponding to the wavelength, which is 433.36 nm in acetone system and 794.8 nm in methane system.
易成, 王传新, 熊江, 范咏志, 汪建华, 马志斌, 满卫东, 王升高. 热丝CVD沉积金刚石薄膜过程中的发射光谱研究[J]. 激光与光电子学进展, 2015, 52(10): 103003. Yi Cheng, Wang Chuanxin, Xiong Jiang, Fan Yongzhi, Wang Jianhua, Ma Zhibin, Man Weidong, Wang Shenggao. Analysis of Optical Emission Spectroscopy in Diamond of Hot Filament Chemical Vapor Deposition[J]. Laser & Optoelectronics Progress, 2015, 52(10): 103003.