光子学报, 2015, 44 (10): 1011003, 网络出版: 2015-11-30   

入射光束角度及强度偏差对多光束干涉光刻结果的影响

Influence on Patterns Quality of Multi-beam Interference Lithography Caused by the Deviations of Incidence Azimuth Angle and Intensity of Light
作者单位
西安工业大学 光电工程学院,西安 710021
摘要
建立了多光束干涉光刻干涉场内光强分布的数学模型,仿真计算了双光束、三光束、四光束干涉曝光情况下,入射光束存在角度偏差以及各入射光强不同时的干涉图样,并与理想状态的模拟结果进行对比.结果表明:光束入射角度偏差主要影响干涉图样的形状和周期;入射光的光强不同是降低图形对比度的主要因素.利用402 nm波长激光光源进行多光束干涉光刻实验.设定激光器输出功率32 mW,每两束光夹角为16°,通过控制曝光、显影工艺,双光束干涉光刻产生周期为1.4 μm的光栅、点阵和孔阵结构,三光束干涉光刻产生周期为1.7 μm的六边形图形阵列.该模型可为利用干涉光刻技术制备微细周期结构,提高光刻图形质量,提供一定的理论参考.
Abstract
Based on the mathematical model of light intensity distribution in multi-beam interference field,the patterns have been calculated and stimulated respectively for two beams,three beams and four beams interference exposure,in the case of having incidence angle errors and unequal intensity of each beam. The stimulated results have been analyzed and compared with that in ideal situation. The study results show that angel deviation of incident beam mainly affects the shape and period of interference pattern,and inequality of light intensity of each incident beam is the main factor that leads to decrease of pattern contrast. The multi-beam interference lithography experiments have been done by using a laser source with the wavelength of 402 nm. Under the conditions of 32 mW laser output power and 16° angle between two incident beams,by controlling exposure dose and development process,the gratings,dots and holes array with the period of about 1.4 μm have been generated by two-beam interference lithography,and the hexagon array with the period of about 1.7 μm have been got by three-beam interference lithography. The results provide some theoretical reference for fabricating micro-nano periodic structures and improving the quality of pattern by multi-beam interference lithography technology.

马丽娜, 张锦, 蒋世磊, 孙国斌, 杨国锋, 杭凌侠, 弥谦, 计玮. 入射光束角度及强度偏差对多光束干涉光刻结果的影响[J]. 光子学报, 2015, 44(10): 1011003. MA Li-na, ZHANG Jin, JIANG Shi-lei, SUN Guo-bin, YANG Guo-feng, HANG Ling-xia, MI Qian, JI Wei. Influence on Patterns Quality of Multi-beam Interference Lithography Caused by the Deviations of Incidence Azimuth Angle and Intensity of Light[J]. ACTA PHOTONICA SINICA, 2015, 44(10): 1011003.

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