类金刚石薄膜激光损伤阈值低，已经严重制约其在红外激光系统中的应用。基于非平衡磁控溅射技术，在硅基底上沉积类金刚石薄膜；采用离子束流后处理技术，用正交实验法确定影响处理效果的主要因素，对已沉积完成的DLC薄膜进行离子束轰击；在不同处理工艺下，观测薄膜样品的光学常数及拉曼光谱，最后进行了激光损伤测试。从测试结果可知，离子束流后处理参数：离子能量1000 eV、放电电流30~40 mA、轰击时间8 min时，透射率由原来的60.65%提高到了65.98%；消光系数在900 nm后明显降低，DLC薄膜的激光损伤阈值从0.69 J/cm^{2提高到1.01 J/cm2。}

The low laser damage threshold of the diamond like carbon film seriously restricts its application in the infrared laser system. Un-balanced magnetron sputtering was used to deposit a diamond-like carbon (DLC) film on Si substrates. The DLC film was bombarded and processed by ion beam technique, and the main influencing effect factors of the ion beam were determined by the orthogonal experiment method. The DLC films were treated based on the parameters of the ion beam. The optical constants and Raman spectra of the DLC films were observed, and the laser induced damage threshold was performed. It can be seen that the transmittance increased from 60.65% to 65.98%, the extinction coefficient decreased obviously after 900 nm, and the laser damage threshold of the DLC film increased from 0.69 J/cm^{2 to 1.01 J/cm2.}