极紫外(EUV)光刻物镜设计不仅要在系统优化阶段尽可能减小残余像差，还必须选择像质补偿器合理分配各项公差，从而在保证系统可制造性的前提下实现预期性能。针对一套数值孔径0.33 的极紫外光刻物镜，进行了补偿器的优选和定位精度分析。根据结构参量对系统波像差的灵敏度并结合各结构参量之间的相关性选择了6个像质补偿器，并分析了非补偿器结构参量的公差。在此基础上，提出了基于蒙特卡罗法的补偿器定位精度分析方法。利用蒙特卡罗法模拟实际装调过程，通过分析补偿器定位精度对像质的影响，确定满足统计像质要求的补偿器定位精度。结果显示，当物镜系统最严间隔公差、偏心公差、倾斜公差分别在± 2 μm、± 3 μm、± 5 μrad 范围内，间隔和偏心补偿器的定位精度为± 0.1 μm 时，系统波像差均方根(RMS)值在97.7 %的置信概率下小于1 nm。

Extreme ultraviolet (EUV) lithographic projection objective must be well-corrected for aberrations after optimization process. However, selecting compensators to allocate tolerances properly is also needed in consideration of manufacturability and expected performance. For an EUV lithographic projection objective with a numerical aperture of 0.33, six compensators are chosen based on the sensitivity to wavefront error and correlation, and then the tolerances of non-compensators are analyzed. Furthermore, a method based on Monte Carlo trials is presented to analyze the accuracy of compensators. Using this method, the accuracy of compensators is obtained. The result shows that the most rigorous thickness tolerances, decentering tolerances and tilt tolerances are in the range of ± 2 μm, ± 3 μm and ± 5 μrad respectively，and the accuracy of thickness and decentering compensators is ± 0.1 μm. The root mean square (RMS) wavefront error of the projection system is less than 1 nm in the probability of 97.7 %.