提出了一种基于空间像主成分分析的超大数值孔径光刻机投影物镜波像差检测方法。通过采用偏振光照明和矢量光刻成像模型并考虑投影物镜的偏振像差，准确表征了超大数值孔径光刻机的空间像，从而提高了像差检测模型的精度，实现了超大数值孔径光刻机投影物镜33项泽尼克像差(Z₅~Z₃₇)的高精度检测。相比于原基于空间像主成分分析的投影物镜成像差检测技术(AMAI-PCA)方法，所提方法适用于超大数值孔径光刻机投影物镜波像差检测。采用光刻仿真软件PROLITH 对所提方法的检测精度进行了仿真验证，并分析了空间像采样间隔对波像差检测精度的影响。仿真结果表明，该方法对泽尼克像差(Z₅~Z₃₇)的检测精度优于0.85×10^-3λ。

An aberration measurement method for hyper-NA lithographic projection lens by use of aerial image based on principal component analysis is proposed. Aerial images of the hyper-NA lithographic projection lens are expressed accurately by using polarized light and vector imaging model, as well as considering the polarization properties. As a result, the accuracy of the measurement model is improved and the aberrations of hyper- NA lithographic projection lens are measured accurately. Compared with the conventional AMAI-PCA method, the proposed method is applicable for the hyper-NA lithographic projection lens. The lithographic simulator PROLITH is used to validate the accuracies of aberration measurement and analyze the impacts of the sample interval of aerial images on the accuracy of the aberration measurement. The result shows that the proposed method can retrieve 33 terms of Zernike coefficients (Z₅~Z₃₇) with maximum error less than 0.85×10^-3λ.