摘要

为了精确控制曝光剂量，需要精确测量光刻系统的光学透射率。采用了双光路对比的方法进行透射率测量，有效地消除了准分子激光器能量波动带来的透射率测量误差。并通过加入起偏器，消除了准分子激光器偏振态不稳定带来的误差。搭建了深紫外光学透射率测量装置，对1片可计算透射率的光学样品进行透射率测量，其测量结果与透射率理论计算结果基本一致。测量结果显示，该装置的测量重复性可达到0.3%。通过分光光度计对该光学样品进行测量，通过结果对比，该装置的测量结果与分光光度计的测量结果相差0.28%。另外，该装置应用灵活，可以测量光学系统的透射率，具有不受待测光学样品尺寸影响的优点。

Abstract

In order to accurately control the exposure dose, it is necessary to measure optical transmittance of lithography system accurately. A double-contrast method of optical transmittance measurement is introduced. It effectively eliminates the measurement error caused by an excimer laser energy fluctuation. In order to eliminate the measurement errors caused by diversification of excimer laser polarization, a polarizer is used in this equipment. The experimental setup is designed to measure the transmittance of an optical sample whose transmittance can be calculated accurately. The experimental results show that measurement results are consistent with theoretical calculations and the repeatability of measurement is less than 0.3%. The transmittance of optical sample is measured by the spectrophotometer, and the difference between the two kinds of equipment is 0.28% . Furthermore, the equipment has flexible application for transmittance measurement of optical system and advantage for not influenced by optical sample sizes.

补充资料

中图分类号：TH741;TN23;TH247

DOI：10.3788/cjl201643.0308002

所属栏目：测量与计量

收稿日期：2015-08-17

修改稿日期：2015-10-12

网络出版日期：--

作者单位    点击查看

联系人作者：陈明(chenming@siom.ac.cn)

备注：陈明(1983—)，男，博士研究生，主要从事高NA 光刻技术方面的研究。

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引用该论文

Chen Ming,Xie Chengke,Yang Baoxi,Huang Huijie. Development of Device for High-Precision Deep Ultraviolet Optical Transmittance Measurement[J]. Chinese Journal of Lasers, 2016, 43(3): 0308002

陈明,谢承科,杨宝喜,黄惠杰. 高精度深紫外光学透射率测量装置的研制[J]. 中国激光, 2016, 43(3): 0308002