本文将Bowtie 孔径结构与金属-介质-金属结构相结合，提出了一种新的局域表面等离子体共振纳米直写光刻结构，得益于金属-介质-金属结构中顶层透射Ag 对透射光的放大增强以及底层反射Ag 对透射光的反射补偿作用，聚焦光斑的尺寸得到压缩的同时深度得到了显著提高，理论仿真中当焦斑的FWHM 为28 nm 时，焦斑深度可以达到20 nm 以上，这相对于传统纳米直写光刻结构，将焦斑的深度提升了4 倍。随后，通过相关验证实验在光刻胶中获得了FWHM 为47 nm，曝光深度为25 nm 的焦斑图形，进一步证实了该结构在压缩焦斑尺寸以及提升焦斑深度上的显著优势。

We theoretically utilize bowtie aperture combined with the Metal-insulator-metal (MIM) scheme to obtain sub-30-nm (λ/12) high aspect plasmonic spot. The improvement of the depth profile is attributed to the asymmetry electromagnetic mode excitation in the metal-insulator-metal structure and the decaying compensation of the reflective metal layer. It is demonstrated that the depth profile of the 28 nm hot spot is more than 20 nm, which is about 4 times of the bowtie aperture without the MIM scheme. Futuremore, the spot of 47 nm diameter (FWHM) and 25 nm depth was achieved in photo-resist in the experiment, which demonstrated the advantages of the new structure on reducing the size and improving the depth profile of the spot.structure