为了满足凹球面光刻所需的曲面网栅掩模的需求，建立了凸球面激光直接写入系统用于制作曲面网栅掩模。该系统目前支持最高±20°的基片倾斜，结合加工时的曝光量修正算法，在口径为50 mm、曲率半径为51.64 mm的凸球面基底上制作了矩形网栅图案，并结合双摆台联动在凸面上制作同心圆环图案。实验结果表明，现有凸球面直写系统初步具备加工凸面网栅掩模的能力，为后续的曲面掩模光刻打下坚实基础。

In order to meet the requirement of convex surface mask in concave surface lithography, convex surface laser direct writing system was set up to fabricate the mask. This apparatus supported up to ±20° tilt angle. With the exposure correction algorithm in the process, the system accomplished writing rectangular grid pattern on a spherical substrate with 50 mm caliber and 51.64 mm radius. It was able to draw circular ring pattern on the surface by result of simultaneous motion of two tilting tables. The experiment shows that this setup has the capacity to fabricate the convex mesh lithographic mask and lay a solid base for convex surface lithography technology.