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TFT-LCD残影不良的研究与改善

Research and improvement of TFT-LCD image-retention

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摘要

影像残留是TFT-LCD,特别是TN型产品常见的不良,对产品良率影响很大。本文从产品设计、工艺参数、工艺管控3个方面对残影进行分析。发现产品设计时Data线两侧段差过大,是导致残影发生的主要原因,通过增加配向膜厚度和摩擦强度值可以有效降低残影,实验得出配向膜膜厚高于110 nm,摩擦强度高于5.5 N·m时无残影发生。通过控制配向膜工程与摩擦工程间的延迟时间在5 h,摩擦工程与对盒工程间的延迟时间在10 h,并且严格管控ITO偏移量可以有效减少Panel内部电场,从而降低残影。通过以上措施,对于15.6HD产品,良率提升了10%,为企业高效生产奠定基础。

Abstract

Image-retention has always been a problem in the TFT-LCD production process, especially for the TN production, and already had a great influence on the production yield of the products. This article mainly discussed the three aspects which had the influence on the incidence of image-retention including product designs, process parameters and the process control. The results showed that the main reason of image-retention is the oversize of segment difference at both sides of the Data line during product designs. And it was found that image-retention could be reduced by increasing the alignment film thickness and the rubbing torque value. No image-retention occurs when the alignment film thickness and the rubbing torque value are higher than 110 nm and 5.5 N·m, respectively. It can lower the image-retention by controlling the ITO overlay and controlling the PI-Rub delay time in 5 h, Rub-Assy delay time in 10 h to reducing the internal electric field of panel. As for 15.6HD products, the yield increased by 10% through the above measures which might lay the foundation of high-efficient production for enterprises.

Newport宣传-MKS新实验室计划
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中图分类号:TN141.9

DOI:10.3788/yjyxs20163103.0270

所属栏目:材料与器件

收稿日期:2015-09-08

修改稿日期:2015-10-11

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范恒亮:合肥鑫晟光电科技有限公司,安徽 合肥 230012
汤展峰:合肥鑫晟光电科技有限公司,安徽 合肥 230012
刘利萍:合肥鑫晟光电科技有限公司,安徽 合肥 230012
李静:合肥鑫晟光电科技有限公司,安徽 合肥 230012
黄静:合肥鑫晟光电科技有限公司,安徽 合肥 230012
刘岩龙:合肥鑫晟光电科技有限公司,安徽 合肥 230012

联系人作者:范恒亮(fanhengliang@boe.com.cn)

备注:范恒亮(1988-),男,安徽合肥人,硕士,高级工程师,主要从事液晶显示行业中不良分析改善与新产品导入等工作。

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