介绍了一种具有高工艺可控性特征的单晶硅表面亚微米结构阵列介电微球辅助激光-化学复合成型的方法，采用这种方法可以在单晶硅表面制备具有较好周期性和均一性的三维微结构阵列。分析并总结了微球直径、刻蚀时间及激光脉冲能量密度对结构成型的影响规律，根据时域有限差分模拟法和晶硅结晶及其化学刻蚀的基础理论，分析研究了微结构的成型机制，并以样品表面反射率为例，验证了利用不同工艺所制备出的微米结构阵列对其表面光学性能的调控作用。

One method of dielectric microsphere assisted laser irradiation followed by chemical etching for fabrication of sub-micro structure arrays on silicon surface with high processing controllability is presented. Three dimensional micro-structure arrays with high quality of periodicity and homogeneity can be fabricated on silicon surface. The formation rules of microstructure depending on microsphere size, etching time, and laser fluence are analyzed systematically. Based on the finite-difference time-domain simulation and the basic theories of silicon crystallization and chemical etching, the microstructure formation mechanism of the microstructures is investigated. By means of testing reflectivity of fabricated silicon samples, the regulation effect of the microstructure arrays fabricated under different processing conditions on the optical performance of the silicon surfaces is verified.