用高真空磁控溅射设备分别在工作气压为0.40 Pa和0.67 Pa下制备了非晶碳膜全反射镜样品，利用X射线掠入射反射测量了膜层厚度、粗糙度和膜层密度，用原子力显微镜测量了样品的表面粗糙度，用同步辐射测量了不同工作气压下制备的非晶碳膜全反射镜的反射率，并对测量结果进行了分析讨论.测试结果表明：在0.40 Pa工作气压下制备的非晶碳膜反射镜的性能优于在0.67 Pa工作气压下制备的反射镜的性能，在掠入射角小于4.5°时，非晶碳膜全反射镜在5 nm以上波段有比较平坦的高反射率，在波长小于5 nm波段，反射率急剧下降.

The samples were fabricated using high vacuum direct current magnetron sputtering system. The layer thicknesses, roughness and densities of samples were measured by X-ray grazing incidence reflection equipment. Surface roughness were measured by AFM (Atomic Force Microscope ). The reflectivity properties of total reflection amorphous carbon mirrors fabricated under different working pressures were characterized using synchrotron radiation. The measured results show that the properties of total reflection amorphous carbon mirrors fabricated under 0.40 Pa working pressures are superior to that fabricated under 0.67 Pa working pressures. At grazing angle 4.5°, total reflection amorphous carbon mirrors show high flat reflection beyond wavelength of 5nm while reflection sharply decrease within 5nm wavelength. Fitting results indicate that the densities of fabricated total reflection amorphous carbon mirrors is the reason which causes the actual reflection lower than designed reflection.