光子学报, 2016, 45 (7): 070731001, 网络出版: 2016-08-18  

用于355 nm紫外激光器的消偏振二向色镜

Depolarised Dichroic Mirror for the 355nm Ultraviolet Laser System
作者单位
1 长春理工大学 光电工程学院, 长春 130022
2 重庆理工大学 电子信息与自动化学院, 重庆 400050
3 西南技术物理研究所, 成都 610000
4 国网重庆市电力公司电力科学研究院, 重庆 401123
摘要
采用离子束辅助电子束成膜, 用双重膜厚监控方法监控各膜层厚度, 制备了45°入射、808 nm高反、1064 nm高透的消偏振二向色镜, 并用于全固态355nm激光器.将部分薄膜样品在250℃进行退火处理后, 用Lambda950分光光度计测试该样品的光谱性能;用表面热透镜技术测量退火前后该样品的弱吸收值; 用激光阈值损伤装置测试该样品在1064 nm调Q激光下的损伤阈值; 用NIKON显微镜观察样品在不同激光能量辐照下的破斑形貌.实验结果表明:波长为808 nm和1 064 nm时, 薄膜透射率分别为0.04%和99.6%, 符合设计要求, 满足全固态355nm紫外激光器系统所要求的光学性能指标; 退火后的弱吸收值较退火前有所降低; 在激光作用下薄膜产生微破坏喷出, 说明膜层不会向灾难性破坏演变.
Abstract
By using the ion beam assisted deposition to evaporate the materials and utilizing the double film thickness monitoring method to control the thickness of each layer, a depolarised dichroic mirror with the incidence angle of 45°, the spectrum 808nm reflected and 1064nm transmitted was prepared, which was used in an all solid state 355 nm laser. The partial thin film samples were annealed at 250℃, then the transmittance was measured with a Lambda 950 spectrophotometer; the weak absorption value of coatings was measured by a surface thermal lensing technique before and after annealing; the laser-induced damage threshold was tested by a 1 064 nm Q-switch pulsed laser; the morphology of the samples was observed by NIKON microscope under the different laser energy. The experimental results show that, the transmittances of the films are T1064 is 99.6%, T808 is 0.04%, which meet the design requirements, and the optical performance of the film can meet the requirements of the all solid state 355nm ultraviolet laser system; the weak absorption value is decreased after annealing; Micro destruction of the film is emitted under the action of laser, which proves that the film will not evolve to a catastrophic failure.

庄秋慧, 刘国军, 付秀华, 马孜, 王三强. 用于355 nm紫外激光器的消偏振二向色镜[J]. 光子学报, 2016, 45(7): 070731001. ZHUANG Qiu-hui, LIU Guo-jun, FU Xiu-hua, MA Zi, WANG San-qiang. Depolarised Dichroic Mirror for the 355nm Ultraviolet Laser System[J]. ACTA PHOTONICA SINICA, 2016, 45(7): 070731001.

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