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Laser annealing of SiO2 film deposited by ICPECVD for fabrication of silicon based low loss waveguide

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Abstract

Laser annealing of silicon dioxide (SiO2) film formed by inductively coupled plasma enhanced chemical vapor deposition (ICPECVD) is studied for the fabrication of low loss silicon based waveguide. The influence of laser annealing on ICPECVD-deposited SiO2 film is investigated. The surface roughness, refractive index, and etch rate of annealed samples are compared with those of SiO2 film obtained by thermal oxidation. It is demonstrated that the performance of ICPECVD-deposited SiO2 film can be significantly improved by laser annealing. Al2O3/SiO2 waveguide has been fabricated on silicon substrate with the SiO2 lower cladding formed by ICPECVD and laser annealing process, and its propagation loss is found to be comparable with that of the waveguide with thermally oxidized lower cladding.

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DOI:10.1007/s12200-016-0616-1

所属栏目:RESEARCH ARTICLE

基金项目:This work was supported by the National Basic Research Program of China (Nos. 2012CB315605 and 2014CB340002), the National Natural Science Foundation of China (Grant Nos. 61210014, Fig. 7 RMS surface roughness of the samples (a) before etching, (b) after SF6 dry etch, (c) after wet etching in buffered HF Table 1 Correlation between the lower cladding and propagation loss lower cladding propagation loss/(dB$cm–1) TE mode TM mode As-deposited 7.8 6.4 annealed with 14 W power 6.4 5.6 thermal oxidation 6.4 5.4 Ya’nan WANG et al. Laser annealing of SiO2 film deposited by ICPECVD for fabrication of silicon based low loss waveguide 327 61321004, 61307024, 61574082 and 51561165012), the High Technology Research and Development Program of China (No. 2015AA017101), the Independent Research Program of Tsinghua University (No. 20131089364) and the Open Fund of State Key Laboratory on Integrated Optoelectronics (Nos. IOSKL2012KF08 and IOSKL2014KF09).

收稿日期:2016-01-31

修改稿日期:2016-02-17

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作者单位    点击查看

Ya’nan WAN:Tsinghua National Laboratory for Information Science and Technology/State Key Lab of Integrated Optoelectronics,Department of Electronic Engineering, Tsinghua University, Beijing 100084, China
Yi LUO:Tsinghua National Laboratory for Information Science and Technology/State Key Lab of Integrated Optoelectronics,Department of Electronic Engineering, Tsinghua University, Beijing 100084, China
Changzheng SUN:Tsinghua National Laboratory for Information Science and Technology/State Key Lab of Integrated Optoelectronics,Department of Electronic Engineering, Tsinghua University, Beijing 100084, China
Bing XIONG:Tsinghua National Laboratory for Information Science and Technology/State Key Lab of Integrated Optoelectronics,Department of Electronic Engineering, Tsinghua University, Beijing 100084, China
Jian WANG:Tsinghua National Laboratory for Information Science and Technology/State Key Lab of Integrated Optoelectronics,Department of Electronic Engineering, Tsinghua University, Beijing 100084, China
Zhibiao HAO:Tsinghua National Laboratory for Information Science and Technology/State Key Lab of Integrated Optoelectronics,Department of Electronic Engineering, Tsinghua University, Beijing 100084, China
Yanjun HAN:Tsinghua National Laboratory for Information Science and Technology/State Key Lab of Integrated Optoelectronics,Department of Electronic Engineering, Tsinghua University, Beijing 100084, China
Lai WANG:Tsinghua National Laboratory for Information Science and Technology/State Key Lab of Integrated Optoelectronics,Department of Electronic Engineering, Tsinghua University, Beijing 100084, China
Hongtao LI:Tsinghua National Laboratory for Information Science and Technology/State Key Lab of Integrated Optoelectronics,Department of Electronic Engineering, Tsinghua University, Beijing 100084, China

联系人作者:Yi LUO(luoy@tsinghua.edu.cn)

备注:Ya’nan Wang is currently pursuing the Ph.D. degree in electronic engineering from Tsinghua University, Beijing, China. Her research presently focuses on silicon based optical waveguide.

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引用该论文

Ya’nan WANG,Yi LUO,Changzheng SUN,Bing XIONG,Jian WANG,Zhibiao HAO,Yanjun HAN,Lai WANG,Hongtao LI. Laser annealing of SiO2 film deposited by ICPECVD for fabrication of silicon based low loss waveguide[J]. Frontiers of Optoelectronics, 2016, 9(2): 323-329

Ya’nan WAN,Yi LUO,Changzheng SUN,Bing XIONG,Jian WANG,Zhibiao HAO,Yanjun HAN,Lai WANG,Hongtao LI. Laser annealing of SiO2 film deposited by ICPECVD for fabrication of silicon based low loss waveguide[J]. Frontiers of Optoelectronics, 2016, 9(2): 323-329

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