通过采用北京同步辐射源标定了无镀膜闪烁体EJ232的能量响应曲线。该批次无镀膜闪烁体对于能量低于300 eV的X射线的线性响应差。根据实验结果, 进行了镀膜模拟设计, 并通过真空磁控溅射法进行了闪烁体镀膜加工工艺。设计加工后的镀膜闪烁体经过实验标定后, 其结果指标满足设计要求。该镀膜闪烁体对于能量低于1 keV的X射线的平响应特性好, 线性度高于99%。该闪烁体对普朗克谱的模拟输出结果表明, 其输出谱与输入谱之间形变小, 因此该镀膜闪烁体在Z-pinch实验中能有较好的适用性。

The energy response curve of EJ232 without plating film was calibrated by the soft X-ray in Beijing Synchrotron Radiation Facility. The energy response curve of this type of EJ232 to less than 300 eV X-ray was obviously non-linear. According to the result, a new structure of EJ232 was designed and was achieved via vacuum magnetron sputtering. The calibration result of the designed EJ232 satisfied the request. The energy response of this kind of EJ232 to less than 1 keV X-ray has a good linearity, with a coefficient better than 99%. The simulation response result to Planckian spectrum indicates that the shape of output spectrum is similar to that of input spectrum. As a result, this designed EJ232 would be useful in the Z-pinch experiment.